The sub-µm- and nanostructured thin metal layers and dielectric surfaces exhibit manifold applications. However, the fast, easy and cost-effective fabrication is still a challenge. A possible technological solution is laser-induced self-organized processes like IPSM-LIFE (laser-induced front side etching using in-situ pre-structured metal layer). At IPSM-LIFE, a metal covered dielectric is irradiated where self-organized molten metal layer deformation process assists the structuring. A chromium-fused silica system was irradiated by a KrF excimer laser (λ = 248 nm, Δtp = 25 ns, f = 100 Hz). The IPSM-LIFE can be divided into two steps: STEP 1 and STEP 2. At IPSM – LIFE - STEP 1: The laser irradiation of thin metal layers on dielectric surfaces results in a melting and consequently in a nanostructuring process of the metal layer. The laser treatment induced a large-area modification of the sample surface. These modifications allow a macroscopic adjustment of the optical properties as well as of the water contact angle. The transmission can be variated from ~3 % to ~ 74 % for visible light and the water contact angle from < 5° to ~ 97°. The localized modification of the optical properties allows the fabrication of high-resolution greyscale images. Furthermore, the pre-structured metal layer can be used as a mask for a reactive ion beam etching (RIBE) of the SiO2. The RIBE process allows the fabrication of sub-µm glass structures with a diameter down to 30 nm and a high aspect ratio (>10) at the same time. At IPSM-LIFE - STEP 2: A subsequent high laser fluence treatment of the pre-structured metal layer results in a structuring of the underlying dielectric surface. The RIBE and IPSM-LIFE structured fused silica surface exhibits water contact angle up to 105°. The resultant surface topography was analyzed by optical (OM), atomic force (AFM) and scanning electron microscopy (SEM).
Large area, high speed, nanopatterning of surfaces by laser ablation is challenging due to the required high accuracy of the optical and mechanical systems fulfilling the precision of nanopatterning process. Utilization of self-organization approaches can provide an alternative decoupling spot precision and field of machining. The laser-induced front side etching (LIFE) and laser-induced back side dry etching (LIBDE) of fused silica were studied using single and double flash nanosecond laser pulses with a wavelength of 532 nm where the time delay ∆τ of the double flash laser pulses was adjusted from ∼50 ns to ∼10 μs. The fused silica can be etched at both processes assisted by a 10 nm chromium layer where the etching depth ∆z at single flash laser pulses is linear to the laser fluence and independent on the number of laser pulses, from 2 to 12 J/cm2, it is ∆z = δLIFE/LIBDE ⋅ Φ with δLIFE ∼ 16 nm/(J/cm2) and δLIBDE ∼ 5.2 nm/(J/cm2) ∼ 3 ⋅ δLIFE. At double flash laser pulses, the ∆z is dependent on the time delay ∆τ of the laser pulses and the ∆z slightly increased at decreasing ∆τ. Furthermore, the surface nanostructuring of fused silica using IPSM-LIFE (LIFE using in-situ pre-structured metal layer) method with a single double flash laser pulse was tested. The first pulse of the double flash results in a melting of the metal layer. The surface tension of the liquid metal layer tends in a droplet formation process and dewetting process, respectively. If the liquid phase life time ∆tLF is smaller than the droplet formation time the metal can be "frozen" in an intermediated state like metal bare structures. The second laser treatment results in a evaporation of the metal and in a partial evaporation and melting of the fused silica surface, where the resultant structures in the fused silica surface are dependent on the lateral geometry of the pre-structured metal layer. A successful IPSM-LIFE structuring could be achieved assisted by a 20 nm molybdenum layer at ∆τ ≥ 174 ns. That path the way for the high speed ultra-fast nanostructuring of dielectric surfaces by self-organizing processes. The different surface structures were analyzed by scanning electron microscopy (SEM) and white light interferometry (WLI).
The nanostructuring of dielectric surfaces using laser radiation is still a challenge. The IPSM-LIFE (laser-induced front side etching using in-situ pre-structured metal layer) method allows the easy, large area and fast laser nanostructuring of dielectrics. At IPSM-LIFE a metal covered dielectric is irradiated where the structuring is assisted by a self-organized molten metal layer deformation process. The IPSM-LIFE can be divided into two steps:
STEP 1: The irradiation of thin metal layers on dielectric surfaces results in a melting and nanostructuring process of the metal layer and partially of the dielectric surface.
STEP 2: A subsequent high laser fluence treatment of the metal nanostructures result in a structuring of the dielectric surface. At this study a sapphire substrate Al2O3(1-102) was covered with a 10 nm thin molybdenum layer and irradiated by an infrared laser with an adjustable time-dependent pulse form with a time resolution of 1 ns (wavelength λ = 1064 nm, pulse duration Δtp = 1 – 600 ns, Gaussian beam profile). The laser treatment allows the fabrication of different surface structures into the sapphire surface due to a pattern transfer process. The resultant structures were investigated by scanning electron microscopy (SEM). The process was simulated and the simulation results were compared with experimental results.
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