Mr. Itaru Kamohara Profile

Itaru Kamohara

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Publications (8)

Proceedings Article | 24 March 2017 Presentation + Paper

Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance

Weimin Gao, Victor Blanco, Vicky Philipsen, Itaru Kamohara, Yves Saad, Ivan Ciofi, Lawrence Melvin, Eric Hendrickx, Vincent Wiaux, Ryoung Han Kim

Proceedings Volume 10143, 101430I (2017) https://doi.org/10.1117/12.2259964

KEYWORDS: Extreme ultraviolet lithography, Optical lithography, 3D modeling, Data modeling, Resistance, Photomasks, Calibration, Stochastic processes, Semiconducting wafers

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Proceedings Article | 26 March 2015 Paper

Rigorous wafer topography simulation for investigating wafer alignment quality and robustness

Nicoló Morgana, Dmitrii Gavrilin, Andreas Greiner, Detlef Hofmann, Itaru Kamohara, Ulrich Klostermann, Holger Moeller, Juergen Preuninger

Proceedings Volume 9426, 94260S (2015) https://doi.org/10.1117/12.2086075

KEYWORDS: Optical alignment, Semiconducting wafers, Signal processing, Silicon, Oxides, Computer simulations, Manufacturing, Visualization, Metals, Etching

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Proceedings Article | 19 March 2015 Paper

Experimental validation of stochastic modeling for negative-tone develop EUV resists

Itaru Kamohara, Weimin Gao, Ulrich Klostermann, Thomas Schmöller, Wolfgang Demmerle, Kevin Lucas, Danilo De Simone, Eric Hendrickx, Geert Vandenberghe

Proceedings Volume 9422, 942223 (2015) https://doi.org/10.1117/12.2085506

KEYWORDS: Line width roughness, Stochastic processes, Calibration, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Data modeling, Scanning electron microscopy, Photoresist processing, Photomasks

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Proceedings Article | 31 March 2014 Paper

Experimental validation of rigorous, 3D profile models for negative-tone develop resists

Weimin Gao, Ulrich Klostermann, Itaru Kamohara, Thomas Schmoeller, Kevin Lucas, Wolfgang Demmerle, Peter De Bisschop, Julien Mailfert

Proceedings Volume 9052, 90520C (2014) https://doi.org/10.1117/12.2046522

KEYWORDS: 3D modeling, Etching, Atrial fibrillation, Scanning electron microscopy, Semiconducting wafers, Photoresist processing, Data modeling, Calibration, Optical proximity correction, Optical lithography

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Proceedings Article | 20 May 2011 Paper

Role of ellipsometry in DPT process characterization and impact of performance for contact holes

Itaru Kamohara, Vitaliy Domnenko, Alexander Philippou

Proceedings Volume 8081, 80810R (2011) https://doi.org/10.1117/12.899901

KEYWORDS: Ellipsometry, Lithography, Semiconducting wafers, Signal processing, Signal detection, Diffraction, Etching, Photoresist processing, Nanoimprint lithography, Wafer-level optics

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SPIE Journal Paper | 1 April 2011

Split, overlap, stitching, and process design for double patterning considering local reflectivity variation by using rigorous three-dimensional wafer-topography and lithography simulation

Itaru Kamohara, Thomas Schmöller

JM3, Vol. 10, Issue 02, 023013, (April 2011) https://doi.org/10.1117/12.10.1117/1.3599858

KEYWORDS: Double patterning technology, Reflectivity, Photomasks, Nanoimprint lithography, Lithography, Semiconducting wafers, Image processing, Photoresist processing, Computer aided design, Logic

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Proceedings Article | 4 March 2010 Paper

Comparative study of resolution limits for double patterning and EUV processes for the 32nm contact hole case

Itaru Kamohara, Keiichi Tajima, Thomas Schmoeller

Proceedings Volume 7640, 76400D (2010) https://doi.org/10.1117/12.846470

KEYWORDS: Double patterning technology, Photomasks, Extreme ultraviolet, Source mask optimization, Extreme ultraviolet lithography, Resolution enhancement technologies, Line width roughness, EUV optics, Image processing, Diffraction

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Proceedings Article | 16 March 2009 Paper

Split, overlap/stitching, and process design for double patterning considering local reflectivity variation by using rigorous 3D wafer-topography/lithography simulation

Itaru Kamohara, Thomas Schmoeller

Proceedings Volume 7274, 72740H (2009) https://doi.org/10.1117/12.813976

KEYWORDS: Double patterning technology, Reflectivity, Photoresist processing, Photomasks, Nanoimprint lithography, Lithography, 3D image processing, Semiconducting wafers, Image processing, Logic

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Showing 5 of 8 publications

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