Dr. James Beach
Senior Member/Technical Staff at SEMATECH Inc
SPIE Involvement:
Author | Instructor
Publications (9)

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65181S (2007) https://doi.org/10.1117/12.714214
KEYWORDS: Photoresist materials, Semiconducting wafers, Metrology, Critical dimension metrology, Scanning electron microscopy, Scanners, Lithography, Process control, Calibration

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598535
KEYWORDS: Photomasks, Lithography, Reticles, Phase shifts, Quartz, Etching, Manufacturing, Vestigial sideband modulation, Critical dimension metrology, Nanoimprint lithography

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485413
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Scanners, Overlay metrology, Optical proximity correction, Fiber optic illuminators, Phase shifts, Quartz, Lithographic illumination

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467763
KEYWORDS: Photomasks, Printing, Phase shifts, Scanners, Electroluminescence, Phase measurement, Lithography, Overlay metrology, Manufacturing, Image processing

Proceedings Article | 12 July 2002 Paper
Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475664
KEYWORDS: Diffraction, Photomasks, Lithography, Transistors, Lithographic illumination, Nanoimprint lithography, Optical lithography, Phase shifts, Imaging systems, Fiber optic illuminators

Proceedings Article | 24 August 2001 Paper
Martha Rajaratnam, Greg Baxter, Mark Riggs, Pedro Tasaico, John Zimmerman, James Beach, P. Holland, Chris Morris, Kyle Spurlock
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436907
KEYWORDS: Digital signal processing, Current controlled current source, Reticles, Photoresist processing, Line edge roughness, Reflection, Scanning electron microscopy, Radon, Reflectivity, Interfaces

Proceedings Article | 23 June 2000 Paper
Patrick Lysaght, Billy Nguyen, Gennadi Bersuker, Joe Bennett, Tony Hare, Theodore Doros, James Beach
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388364
KEYWORDS: Ions, Semiconducting wafers, Boron, Photomasks, Arsenic, Deep ultraviolet, Silicon, Photoresist materials, Transistors, Plasma

Proceedings Article | 23 June 2000 Paper
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388292
KEYWORDS: Photoresist materials, Semiconducting wafers, Nitrogen, Deep ultraviolet, Particles, Polymers, Optical lithography, Contamination, Scanning electron microscopy, Tin

Proceedings Article | 2 June 2000 Paper
Patrick Lysaght, Israel Ybarra, Harry Sax, Gaurav Gupta, Michael West, Theodore Doros, James Beach, Jim Mello
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386483
KEYWORDS: Copper, Semiconducting wafers, Particles, Contamination, Lithography, Etching, Tantalum, Optical lithography, Chemical mechanical planarization, Corrosion

Showing 5 of 9 publications
Course Instructor
SC679: Introduction to Microlithography: Theory, Resolution Enhancement and Future Trends
This course covers the optics of exposure tools, the chemistry of resists, and the effects of processing variables and different exposure techniques on the final relief image. Microlithography is traced from its origins to modern day, to its likely future with emphasis placed on optical extension. Different resolution enhancement techniques are described such as off-axis illumination and the use of various phase-shift masks. The chemistry of resists are detailed and are related back to their responses to different processing parameters/behaviors. Non-conventional resist processing (now starting to receive acceptance) is also described. Finally, emerging lithography technologies are discussed to outline the likely future directions of the industry.
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top