CONFERENCE PROCEEDINGS
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Dr. Jason C. Yee
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Author
Publications (5)
Proceedings Article | 15 July 2003 Paper
Complete monitoring strategy to quantify matching and performance for multiple CDSEM in advanced fab
Pey-Yuan Lee, Chi-Shen Lo, Yi-Hung Chen, Thomas Teng, Steven Fu, Mico Chu, Jason Yee
Proceedings Volume 5041, (2003) https://doi.org/10.1117/12.485227
KEYWORDS: Metals, Data modeling, Materials processing, Material characterization, Diagnostics, Manufacturing, Carbon, Contamination, Plasma, Critical dimension metrology
Proceedings Article | 24 July 2002 Paper
Stable E-beam metrology on ArF resist for advanced process control
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474260
KEYWORDS: Plasma, Plasma etching, Etching, Plasma treatment, Metrology, Critical dimension metrology, Photoresist materials, Process control, Ions, Scanning electron microscopy
Proceedings Article | 22 August 2001 Paper
Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor
Stephen Hsu, Xuelong Shi, Robert Socha, J. Fung Chen, Jason Yee, Mohan Anath, Sunil Desai, Philip Imamura, Micheal Sherrill, Y. Tseng, H. Chang, J. Kao, Alex Tseng, WeiJyh Liu, Anseime Chen, Arthur Lin, Jan Kujten, Eric Jacobs, Arjan Verhappen
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436806
KEYWORDS: Photomasks, Photoresist processing, Binary data, Optical proximity correction, Critical dimension metrology, Reticles, Semiconducting wafers, Electroluminescence, Lithography, Scanning electron microscopy
Proceedings Article | 12 February 1997 Paper
Initial characterization results of a low-voltage CD SEM for reticle metrology
Rich Quattrini, Craig MacNaughton, Richard Elliott, Waiman Ng, Rohit Malhotra, Mohan Ananth, Jason Yee
Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301185
KEYWORDS: Scanning electron microscopy, Photomasks, Metrology, Critical dimension metrology, Semiconducting wafers, Reticles, Quartz, Silicon, Photoresist materials, Glasses
Proceedings Article | 21 May 1996 Paper
Benchmarking multimode CD-SEM metrology to 180 nm
Kevin Monahan, Farid Askary, Richard Elliott, Randy Forcier, Rich Quattrini, Brian Sheumaker, Jason Yee, Herschel Marchman, Robert Bennett, Steven Carlson, Harry Sewell, Diane McCafferty, Javed Sumra, Jane Yan
Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240105
KEYWORDS: Scanning electron microscopy, Metrology, Semiconducting wafers, Lithography, Reticles, Deep ultraviolet, Atomic force microscopy, Critical dimension metrology, Silicon, Calibration
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