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Jennifer E. Kopp
at KLA Corp
SPIE Involvement:
Author
Publications (2)
Proceedings Article | 14 December 2009 Paper
Immersion and dry lithography monitoring for flash memories (after develop inspection and photo cell monitor) using a darkfield imaging inspector with advanced binning technology
P. Parisi, A. Mani, C. Perry-Sullivan, J. Kopp, G. Simpson, M. Renis, M. Padovani, C. Severgnini, P. Piacentini, P. Piazza, A. Beccalli
Proceedings Volume 7520, 75201W (2009) https://doi.org/10.1117/12.835839
KEYWORDS: Inspection, Semiconducting wafers, Phase modulation, Critical dimension metrology, Immersion lithography, Lithography, Defect detection, Scanners, Defect inspection, Imaging systems
Proceedings Article | 24 March 2009 Paper
Development and implementation of PWQ on patterned wafer darkfield inspection systems
Uwe Streller, Kay Wendt, Arno Wehner, Jens Goeckeritz, Markus Gahr, Martin Tuckermann, Jennifer Kopp, Monica Hellerqvist
Proceedings Volume 7272, 72723J (2009) https://doi.org/10.1117/12.814149
KEYWORDS: Inspection, Semiconducting wafers, Wafer inspection, Modulation, Lithography, Logic, Reticles, 193nm lithography, Product engineering, Defect inspection
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