Mr. Jinyoung Yoon Profile

Jinyoung Yoon

at SAMSUNG Electronics Co Ltd

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Author

Publications (6)

Proceedings Article | 1 April 2009 Paper

Advanced immersion contact hole patterning for sub 40nm memory applications: a fundamental resist study

Yun-Kyeong Jang, Jin-Young Yoon, Shi-Yong Lee, Kwang-Sub Yoon, Seok-Hwan Oh, Seong-Woon Choi, Woo-Sung Han, Seokho Kang, Thomas Penniman, Duk-Soo Kim, Dong Won Chung, Sung-Seo Cho, Cheng Bai Xu, George Barclay

Proceedings Volume 7273, 727339 (2009) https://doi.org/10.1117/12.814483

KEYWORDS: Diffusion, Polymers, Electroluminescence, Optical lithography, Photoresist materials, Lithography, Electronics, Image compression, Temperature metrology, Resolution enhancement technologies

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Proceedings Article | 4 December 2008 Paper

Practical requirement for reflectivity control in sub 30nm device using high NA immersion lithography

Yun-kyeong Jang, So-ra Han, Hyoung-hee kim, Jin-Young Yoon, Shi-yong Lee, Kwang-sub Yoon, Seok-hwan Oh, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 7140, 714032 (2008) https://doi.org/10.1117/12.804671

KEYWORDS: Reflectivity, Lithography, Critical dimension metrology, Line width roughness, Immersion lithography, Optical lithography, Photomasks, Scanning electron microscopy, Electroluminescence, Control systems

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Proceedings Article | 29 March 2006 Paper

Top barrier coating materials for immersion lithography and beyond

Mitsuhiro Hata, Jin-Young Yoon, Jung-Hwan Hah, Man-Hyoung Ryoo, Sang-Jun Choi, Han-Ku Cho

Proceedings Volume 6153, 61531Y (2006) https://doi.org/10.1117/12.655955

KEYWORDS: Photoresist materials, Thin film coatings, Extreme ultraviolet lithography, Polymers, Coating, Photoresist developing, Semiconducting wafers, Extreme ultraviolet, Lithography, Scanning electron microscopy

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Proceedings Article | 24 March 2006 Paper

Macro analysis of line edge and line width roughness

Jangho Shin, Jinyoung Yoon, Youngjae Jung, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6152, 61520X (2006) https://doi.org/10.1117/12.655516

KEYWORDS: Line width roughness, Software development, Photoresist materials, Edge roughness, Transistors, Critical dimension metrology, Polarization, Statistical analysis, Spectrum analysis, Semiconductors

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Proceedings Article | 14 May 2004 Paper

Simulation technique for the PR flow process using a new viscous flow model

Won-Young Chung, Tai-Kyung Kim, Jin-Young Yoon, Hyun-Woo Kim, Young-Kwan Park, Jeong-Taek Kong

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534809

KEYWORDS: Optical lithography, Lithography, Interfaces, Temperature metrology, 3D modeling, Calibration, Scanning electron microscopy, Resolution enhancement technologies, Thermal modeling, Electron microscopes

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Proceedings Article | 14 May 2004 Paper

Strategy for sub-80nm contact hole patterning considering device fabrication

Jin-Young Yoon, Mitsuhiro Hata, Jung-Hwan Hah, Hyun-Woo Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534811

KEYWORDS: Critical dimension metrology, Photomasks, Photoresist materials, Lithography, Cadmium, Optical lithography, Image processing, Resolution enhancement technologies, Semiconducting wafers, Temperature metrology

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Showing 5 of 6 publications

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