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Dr. Joseph Zekry
at ASML Netherlands BV
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Author
Publications (3)
Proceedings Article | 30 October 2020 Presentation + Paper
Fundamental understanding and experimental verification of bright versus dark field imaging
Natalia Davydova, Jo Finders, John McNamara, Eelco van Setten, Claire van Lare, Joern-Holger Franke, Andreas Frommhold, Renzo Capelli, Grizelda Kersteen, Andreas Verch, Rene Carpaij, Joseph Zekry, Timon Fliervoet
Proceedings Volume 11517, 115170P (2020) https://doi.org/10.1117/12.2573161
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Photoresist processing, Deep ultraviolet, Lithography, Manufacturing, Diffraction, Wafer-level optics, Semiconducting wafers, Scanners
Proceedings Article | 16 October 2020 Presentation + Paper
Experimental verification of high-NA imaging simulations using SHARP
Natalia Davydova, Fei Liu, Markus Benk, Eelco van Setten, Gerardo Bottiglieri, Anton van Oosten, John McNamara, Vincent Wiaux, Joern-Holger Franke, Kenneth Goldberg, DS Nam, Joseph Zekry, Patrick Naulleau, Timon Fliervoet, Rene Carpaij
Proceedings Volume 11517, 1151714 (2020) https://doi.org/10.1117/12.2572846
KEYWORDS: Scanners, Photomasks, Extreme ultraviolet lithography, Optical lithography, Reticles, Extreme ultraviolet, Microscopes, Light sources, Fiber optic illuminators, Projection systems
Proceedings Article | 26 March 2019 Presentation + Paper
High NA EUV lithography: Next step in EUV imaging
Proceedings Volume 10957, 1095709 (2019) https://doi.org/10.1117/12.2514952
KEYWORDS: Source mask optimization, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Photomasks, Diffraction
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