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Joy Huang
at Taiwan Semiconductor Manufacturing Co. Ltd.
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Publications (1)
Proceedings Article | 21 November 2023 Presentation + Paper
New EUV mask blank for N3 technology node and beyond
S. Yang, W. Chen, C. Huang, Chien-Min Lee, Joy Huang, Shy-Jay Lin, C. Chen, Yoshiaki Ikuta, Tomohiko Satoh, Yosuke Nakakita
Proceedings Volume 12751, 127510G (2023) https://doi.org/10.1117/12.2688179
KEYWORDS: Etching, Ruthenium, Extreme ultraviolet, Semiconducting wafers, 3D mask effects, Photoresist processing, Reflection, Optical proximity correction
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