Mr. Katsuya Hayano Profile

Katsuya Hayano

at Hitachi Ltd

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 6 December 2004 Paper

R-mask: simple and low-cost fabrication techniques

Akiko Fujii, Shiho Sasaki, Mochihiro Shimizu, Yukie Kobayashi, Takashi Tominaga, Morihisa Hoga, Hiroshi Mohri, Naoya Hayashi, Katsuya Hayano, Norio Hasegawa, Kunihiro Hosono, Tadashi Arai

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.572191

KEYWORDS: Photomasks, Inspection, Manufacturing, Quartz, Semiconducting wafers, Photoresist processing, Absorbance, Fabrication, Defect inspection, Pellicles

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Proceedings Article | 6 December 2004 Paper

R-mask: a new concept and its application for small-volume production

Katsuya Hayano, Shoji Hotta, Norio Hasegawa, Kunihiro Hosono, Toshihiko Tanaka, Kazuyuki Suko, Shiho Sasaki, Hiroshi Mohri, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.572200

KEYWORDS: Photomasks, Chromium, Semiconducting wafers, Inspection, Defect inspection, Logic devices, Photography, Scanning electron microscopy, Critical dimension metrology, Manufacturing

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Proceedings Article | 28 May 2004 Paper

New double exposure technique using alternating phase-shifting mask with reversed phase

Shoji Hotta, Katsuya Hayano, Kazuyuki Kakuta, Norio Hasegawa

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535152

KEYWORDS: Photomasks, Phase shifts, Reticles, Lithography, Tolerancing, Double patterning technology, Error analysis, Binary data, Silicon, Semiconducting wafers

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Proceedings Article | 30 July 2002 Paper

CD control in phase-edge lithography: the effects of lens aberration and pattern layout

Takuya Hagiwara, Katsuya Hayano, Akemi Moniwa, Hiroshi Fukuda

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474480

KEYWORDS: Critical dimension metrology, Optical proximity correction, Lithography, Photomasks, Optical lithography, Phase shifts, Image processing, Model-based design, Etching, Monochromatic aberrations

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Proceedings Article | 5 July 2000 Paper

Lens aberration measurement technique using attentuated phase-shifting mask

Akira Imai, Katsuya Hayano, Hiroshi Fukuda, Naoko Asai, Norio Hasegawa

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388964

KEYWORDS: Monochromatic aberrations, Photomasks, Semiconducting wafers, Phase shifts, Scanning electron microscopy, Time metrology, Inspection, Defect inspection, Overlay metrology, Optical lithography

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Proceedings Article | 29 June 1998 Paper

Proposal of a composite phase-shifting mask for 0.15-um hole-pattern delineation using KrF exposure

Norio Hasegawa, Katsuya Hayano, Akira Imai, Naoko Asai, Shinji Okazaki

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310781

KEYWORDS: Phase shifts, Composites, Photomasks, Chromium, Transmittance, Modulation, Halftones, Opacity, Quartz, Etching

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Showing 5 of 6 publications

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