Mr. Kazuhito Shigemori Profile

Kazuhito Shigemori

at SCREEN Holdings Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 31 March 2010 Paper

Simplified "Litho-Cluster-Only" solution for double patterning

H. Tanaka, K. Hoshiko, T. Shimokawa, H. Hoefnagels, D. Keller, S. Wang, O. Tanriseven, R. Maas, J. Mallman, K. Shigemori, C. Rosslee

Proceedings Volume 7639, 76391V (2010) https://doi.org/10.1117/12.848462

KEYWORDS: Double patterning technology, Semiconducting wafers, Optical alignment, Scanning electron microscopy, Sensors, Reticles, Lithography, Signal processing, Optical lithography, Photoresist processing

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Proceedings Article | 23 March 2010 Paper

Study of post-develop defect on typical EUV resist

Masahiko Harumoto, Kazuhito Shigemori, Akihiro Hisai, Masaya Asai, Koji Kaneyama

Proceedings Volume 7636, 76362Z (2010) https://doi.org/10.1117/12.846546

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Scanning electron microscopy, Photoresist developing, Inspection, Semiconducting wafers, Defect inspection, Photoresist materials, Bridges, Semiconductors

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Proceedings Article | 1 April 2009 Paper

Backside EBR process performance with various wafer properties

Tomohiro Goto, Kazuhito Shigemori, Rik Vangheluwe, Daub Erich, Masakazu Sanada

Proceedings Volume 7273, 727329 (2009) https://doi.org/10.1117/12.814079

KEYWORDS: Semiconducting wafers, Immersion lithography, Particles, Thin film coatings, System integration, Coating, Chemical vapor deposition, Dielectrics, Carbon, Edge roughness

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Proceedings Article | 1 April 2009 Paper

Defectivity process optimization on immersion topcoat less resist stacks

Kazuhito Shigemori, Suping Wang, Len Tedeschi, Gazi Tanriseven, Raymond Maas, Coen Verspaget, Ruud Marechal, Ad Lammers, Joerg Mallmann, Masahiko Harumoto, Akihiro Hisai, Masaya Asai

Proceedings Volume 7273, 72732B (2009) https://doi.org/10.1117/12.818745

KEYWORDS: Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Signal attenuation, Printing, Scanners, Particles, Coating, Defect inspection, Digital watermarking

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Proceedings Article | 24 March 2008 Paper

Film stacking architecture for immersion lithography process

Tomohiro Goto, Masakazu Sanada, Tadashi Miyagi, Kazuhito Shigemori, Masashi Kanaoka, Shuichi Yasuda, Osamu Tamada, Masaya Asai

Proceedings Volume 6922, 69222X (2008) https://doi.org/10.1117/12.772411

KEYWORDS: Semiconducting wafers, Particles, Lithography, Coating, Diffractive optical elements, Immersion lithography, Thin film coatings, Inspection, Silicon, Scanning electron microscopy

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