Mr. Krister Magnusson Profile

Krister Magnusson

at Optotune Switzerland AG

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 18 March 2016 Paper

Actinic review of EUV masks: performance data and status of the AIMS EUV System

Dirk Hellweg, Sascha Perlitz, Krister Magnusson, Renzo Capelli, Markus Koch, Matt Malloy

Proceedings Volume 9776, 97761A (2016) https://doi.org/10.1117/12.2219247

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Metrology, Scanners, EUV optics, Particles, Prototyping, Reticles, Electromagnetic coupling

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Proceedings Article | 9 November 2015 Paper

Actinic review of EUV masks: status and recent results of the AIMS EUV system

Sascha Perlitz, Jan Hendrik Peters, Markus Weiss, Dirk Hellweg, Renzo Capelli, Krister Magnusson, Matt Malloy, Stefan Wurm

Proceedings Volume 9635, 96351D (2015) https://doi.org/10.1117/12.2205054

KEYWORDS: Extreme ultraviolet, Photomasks, Prototyping, Extreme ultraviolet lithography, Electromagnetic coupling, Metrology, Calibration, Scanners, Image acquisition, Image processing

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Proceedings Article | 16 March 2015 Paper

Actinic review of EUV masks: Status and recent results of the AIMS EUV system

Markus Weiss, Dirk Hellweg, Markus Koch, Jan Hendrik Peters, Sascha Perlitz, Anthony Garetto, Krister Magnusson, Renzo Capelli, Vibhu Jindal

Proceedings Volume 9422, 942219 (2015) https://doi.org/10.1117/12.2086265

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Imaging systems, Line width roughness, Scanners, Prototyping, EUV optics, Metrology, Reflectivity

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Proceedings Article | 29 October 2014 Paper

AIMS EUV first light imaging performance

Anthony Garetto, Renzo Capelli, Krister Magnusson, Jan Hendrik Peters, Sascha Perlitz, Ulrich Matejka, Dirk Hellweg, Markus Weiss, Michael Goldstein

Proceedings Volume 9235, 92350N (2014) https://doi.org/10.1117/12.2068308

KEYWORDS: Extreme ultraviolet, Photomasks, Scanners, Extreme ultraviolet lithography, Inspection, Electromagnetic coupling, Scanning electron microscopy, Prototyping, Manufacturing, Logic

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SPIE Journal Paper | 27 October 2014

Defect mitigation considerations for EUV photomasks

Anthony Garetto, Renzo Capelli, Frederik Blumrich, Krister Magnusson, Markus Waiblinger, Thomas Scherübl, Jan Hendrik Peters, Michael Goldstein

JM3, Vol. 13, Issue 04, 043006, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043006

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing

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Proceedings Article | 17 October 2014 Paper

Scanner arc illumination and impact on EUV photomasks and scanner imaging

Renzo Capelli, Anthony Garetto, Krister Magnusson, Thomas Scherübl

Proceedings Volume 9231, 923109 (2014) https://doi.org/10.1117/12.2067578

KEYWORDS: Photomasks, Extreme ultraviolet, Scanners, Extreme ultraviolet lithography, Semiconducting wafers, Reflectivity, Critical dimension metrology, Lithography, Lithographic illumination, Ions

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Proceedings Article | 1 October 2013 Paper

Utilization of AIMS Bossung plots to predict Qz height deviations from nominal

Anthony Garetto, Doug Uzzel, Krister Magnusson, Jon Morgan, Gilles Tabbone

Proceedings Volume 8886, 88860K (2013) https://doi.org/10.1117/12.2031618

KEYWORDS: Etching, Quartz, Photomasks, Atomic force microscopy, Metrology, Critical dimension metrology, Inspection, Time metrology, Manufacturing, Back end of line

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Proceedings Article | 9 September 2013 Paper

A novel method for utilizing AIMS to evaluate mask repair and quantify over-repair or under-repair condition

Doug Uzzel, Anthony Garetto, Krister Magnusson, Gilles Tabbone

Proceedings Volume 8880, 888029 (2013) https://doi.org/10.1117/12.2027766

KEYWORDS: Etching, Quartz, Bridges, Atomic force microscopy, Opacity, Metrology, 3D modeling, Critical dimension metrology, Photomasks, Refractive index

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Showing 5 of 8 publications

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