Mr. Kyoil Koo Profile

Kyoil Koo

Flash memory OPC Team leader at SAMSUNG Electronics Co Ltd

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Author

Publications (4)

Proceedings Article | 10 April 2024 Presentation + Paper

Advanced pattern defect detection and analysis with artificial intelligence

Sangchul Yeo, Yongsun Jang, Yeongju Guk, Seungju Shin, Hee Jeong, Kyungjae Park, Dawoon Choi, Jaewon Yang, Bongkeun Kim, Kyoil Koo, Seongtae Jeong

Proceedings Volume 12955, 129551E (2024) https://doi.org/10.1117/12.3009806

KEYWORDS: Image classification, Semiconducting wafers, Feature extraction, Artificial intelligence, Machine learning, Visualization, Image processing, Image enhancement, Design, Advanced patterning

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Proceedings Article | 21 November 2023 Presentation + Paper

Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection

Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang, Chang-Min Park, Kyoil Koo, Seongtae Jeong, John Biafore, Mark Smith, Trey Graves, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Kunlun Bai, Janez Krek, Craig Higgins, Sergei Bakarian, Kyeongeun Ko, Roel Gronheid, Kaushik Sah, Andrew Cross, Yi Liu, Alessandro Vaglio Pret, Chris Walker, Vikram Tolani, George Hwa, Peter Hu, Chang Song, Alex Arkhipov, Loemba Bouckou, Chi-Ping Liu, Xiaochun Yang, Kana O'Hara, Donghwan Son

Proceedings Volume 12750, 127500C (2023) https://doi.org/10.1117/12.2687373

KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Printing, Semiconducting wafers, Photoresist materials, Extreme ultraviolet lithography, Statistical analysis, Physical phenomena

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Proceedings Article | 1 May 2023 Presentation + Paper

A novel approach to etch-process-aware intensive layout retarget

Jeeyong Lee, Yangwoo Heo, Ryanggeun Lee, Sangwook Kim, Jisuk Hong, Kyoil Koo, Changmook Yim, Jungmin Kim, Sooyong Lee, Joonsung Kim, Dongho Kim, Seung-Hune Yang, Seongtae Jeong

Proceedings Volume 12499, 124990C (2023) https://doi.org/10.1117/12.2657880

KEYWORDS: Etching, Data modeling, Modeling, Machine learning, Design and modelling, Statistical modeling, Optical proximity correction, Reflection, Feature extraction, Artificial intelligence

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Proceedings Article | 9 September 2013 Paper

OPC modeling using AFM CD measurement

Kyoil Koo, Gyengseop Kim, Sanghun Kim, Seunghune Yang, Sooryong Lee, Youngchang Kim, Jungdal Choi, Hokyu Kang

Proceedings Volume 8880, 88801Q (2013) https://doi.org/10.1117/12.2025552

KEYWORDS: Data modeling, Scanning electron microscopy, Atomic force microscopy, Calibration, Optical proximity correction, Optical calibration, Instrument modeling, Critical dimension metrology, Metrology, Data conversion

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