CONFERENCE PROCEEDINGS
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Len Tedeschi
Program Manager at SCREEN SPE USA LLC
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Publications (4)
Proceedings Article | 1 April 2009 Paper
Defectivity process optimization on immersion topcoat less resist stacks
Kazuhito Shigemori, Suping Wang, Len Tedeschi, Gazi Tanriseven, Raymond Maas, Coen Verspaget, Ruud Marechal, Ad Lammers, Joerg Mallmann, Masahiko Harumoto, Akihiro Hisai, Masaya Asai
Proceedings Volume 7273, 72732B (2009) https://doi.org/10.1117/12.818745
KEYWORDS: Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Signal attenuation, Printing, Scanners, Particles, Coating, Defect inspection, Digital watermarking
Proceedings Article | 24 March 2009 Paper
Track optimization and control for 32nm node double patterning and beyond
Proceedings Volume 7272, 727236 (2009) https://doi.org/10.1117/12.814849
KEYWORDS: Etching, Semiconducting wafers, Double patterning technology, Calibration, Metrology, Photoresist processing, Scanners, Polarization, Zone plates, Critical dimension metrology
Proceedings Article | 4 December 2008 Paper
Cluster optimization to improve CD control as an enabler for double patterning
Proceedings Volume 7140, 714023 (2008) https://doi.org/10.1117/12.805239
KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Double patterning technology, Error analysis, Scanners, Metrology, Polarization, Photoresist processing, Lithographic illumination
Proceedings Article | 16 April 2008 Paper
Immersion lithography bevel solutions
Proceedings Volume 6922, 692206 (2008) https://doi.org/10.1117/12.797082
KEYWORDS: Semiconducting wafers, Particles, Printing, Inspection, Immersion lithography, Coating, Scanners, Lithography, Contamination, Semiconductor manufacturing
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