Mr. Leo P. McArdle Profile

Leo P. McArdle

Photo Equipment Manager at Broadcom Inc

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Publications (2)

Proceedings Article | 28 May 2004 Paper

Characterization of next-generation bake plate requirements for 193-nm lithography tools

Phong Do, Ann Kang, Joseph Pender, Thomas Lehmann, Leo McArdle, Farhat Quli, James Pascale

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537592

KEYWORDS: Semiconducting wafers, Sensors, Temperature metrology, Lithography, Photoresist processing, Critical dimension metrology, Platinum, Temperature sensors, 193nm lithography, Thin films

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Proceedings Article | 14 May 2004 Paper

Optimized filtration for reduced defectivity and improved dispense recipe in 193-nm BARC lithography

Phong Do, Joe Pender, Thomas Lehmann, Leo Mc Ardle, Barry Gotlinsky, Michael Mesawich

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535557

KEYWORDS: Etching, Lithography, 193nm lithography, Industrial chemicals, Semiconducting wafers, Metals, Photoresist materials, Polymers, Chemistry, Logic

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