Mr. Minsuk Kim Profile

Minsuk Kim

at ASML Korea Co Ltd

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 27 April 2023 Presentation + Paper

EPE-aware process optimization for scanner dose and overlay in DRAM use case

Inho Kwak, Nanhyung Kim, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Brandt, Kateryna Lyakhova, Marco Mueller, Ferhad Kamalizadeh, Antonio Corradi, Yun-A Sung, Thomas Kim, Stefan Smith-Meerman, Stefan van der Sanden, Sung-Min Park, Bob Boo, Hyok-Man Kwon

Proceedings Volume 12496, 124960N (2023) https://doi.org/10.1117/12.2658274

KEYWORDS: Scanners, Overlay metrology, Semiconducting wafers, Lithography, Metrology, Dysprosium, Distributed interactive simulations, Design and modelling, Critical dimension metrology, Yield improvement

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Proceedings Article | 27 April 2023 Presentation + Paper

Using active asymmetry control and blind source separation to improve the accuracy of after develop overlay measurements

Jungmin Lee, Doogyu Lee, Eunji Lee, Inbeom Yim, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Marc Noot, Arno van Leest, Simon Mathijssen, Yao Gao, Seung-Bin Yang, Mi-Yeon Baek, Do-Haeng Lee, Han-Gyeol Park, Jong-Hyuk Yim, Thomas Kim, Ho-Hyuk Lee, Kemal Dahha, Stefan Smith-Meerman, Koen van Witteveen, Elliott McNamara, Matthew McLaren

Proceedings Volume 12496, 124960H (2023) https://doi.org/10.1117/12.2658330

KEYWORDS: Semiconducting wafers, Overlay metrology, Metrology, Matrices, Polarization, Wafer testing, Signal processing, Independent component analysis, Education and training, Diffraction

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Proceedings Article | 26 May 2022 Presentation + Paper

Improved multi-lot overlay performance via phase-based ADI overlay measurements

Doogyu Lee, Jungmin Lee, Eunji Lee, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Pieter Kapel, Seung-Bin Yang, Mi-Yeon Baek, Jeroen Wefers Bettink, Se-Ra Jeon, Thomas Kim, Aileen Soco, Olger Zwier, Koen van Witteveen

Proceedings Volume 12053, 1205316 (2022) https://doi.org/10.1117/12.2627719

KEYWORDS: Overlay metrology, Diffraction gratings, Semiconducting wafers, Phase measurement, Phase shifts, Diffraction, Optical testing, Optical metrology, Optical design, Etching

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Proceedings Article | 26 May 2022 Presentation + Paper

Absolute overlay measurement based on voltage contrast defect inspection with programmed misalignments for DRAM devices

Moosong Lee, Jinsun Kim, Dohyeon Park, Yeeun Han, Junseong Yoon, Seung Yoon Lee, Chan Hwang, Achim Woessner, Cyrus Tabery, Miao Wang, Antonio Corradi, Young-Hoon Song, Yun-A Sung, Thomas Kim, Aileen Soco, Jason Kim, Chih-Hung Hsieh

Proceedings Volume 12053, 1205315 (2022) https://doi.org/10.1117/12.2626721

KEYWORDS: Overlay metrology, Semiconducting wafers, Defect inspection, Metrology, Inspection, Standards development, Image processing, Electronics, Etching, Electrons

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