Dr. Maik Gerngross Profile

Dr. Maik Gerngross

at Allresist GmbH

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Publications (1)

Proceedings Article | 26 September 2019 Paper

Industrial photoresist development with the EUV laboratory exposure tool: mask fabrication, sensitivity and contrast

Sascha Brose, Serhiy Danylyuk, Franziska Grüneberger, Maik Gerngroß, Jochen Stollenwerk, Matthias Schirmer, Peter Loosen

Proceedings Volume 11147, 111471I (2019) https://doi.org/10.1117/12.2536794

KEYWORDS: Photoresist materials, Photoresist developing, Extreme ultraviolet lithography, Optical lithography, Photomasks, Lithography, Extreme ultraviolet, Optical filters, Nanostructures, Diffractive optical elements

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