Mr. Manabu Takakuwa Profile

Manabu Takakuwa

at Toshiba Materials Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 2 April 2010 Paper

Overlay sampling optimization by operating characteristic curves empirically estimated

Kentaro Kasa, Masafumi Asano, Takahiro Ikeda, Manabu Takakuwa, Nobuhiro Komine, Kazutaka Ishigo

Proceedings Volume 7638, 76382G (2010) https://doi.org/10.1117/12.846344

KEYWORDS: Inspection, Semiconducting wafers, Error analysis, Overlay metrology, Visualization, Statistical analysis, Optimization (mathematics), Semiconductors, Lithography, Metrology

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Proceedings Article | 23 March 2009 Paper

Polar Correction: new overlay control method for higher-order intra-field error dependent on the wafer coordinates

Manabu Takakuwa, Keigo Toriumi, Nobuhiro Komine, Kazutaka Ishigo, Takuya Kono, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7272, 72720J (2009) https://doi.org/10.1117/12.813490

KEYWORDS: Semiconducting wafers, Overlay metrology, Data corrections, Immersion lithography, Process control, Control systems, Source mask optimization, Distortion, Osmium, Radon

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Proceedings Article | 16 March 2009 Paper

Feasibility of ultra-low k1 lithography for 28nm CMOS node

Shoji Mimotogi, Kazuhiro Takahata, Takashi Murakami, Seiji Nagahara, Kazuhiro Takeda, Masaki Satake, Yosuke Kitamura, Tomoko Ojima, Hiroharu Fujise, Yuriko Seino, Tatsuhiko Ema, Hiroki Yonemitsu, Manabu Takakuwa, Shinichiro Nakagawa, Takuya Kono, Masafumi Asano, Suigen Kyoh, Hideaki Harakawa, Akiko Nomachi, Tatsuya Ishida, Shunsuke Hasegawa, Katsura Miyashita, Makoto Tominaga, Soichi Inoue

Proceedings Volume 7274, 72741F (2009) https://doi.org/10.1117/12.814040

KEYWORDS: Lithography, Photomasks, Lithographic illumination, Binary data, Scanners, SRAF, Logic devices, Optical lithography, Metals, Semiconductors

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Proceedings Article | 4 December 2008 Paper

Patterning performance of hyper NA immersion lithography for 32nm node logic process

Kazuhiro Takahata, Masanari Kajiwara, Yosuke Kitamura, Tomoko Ojima, Masaki Satake, Hiroharu Fujise, Yuriko Seino, Tatsuhiko Ema, Manabu Takakuwa, Shinichiro Nakagawa, Takuya Kono, Masafumi Asano, Suigen Kyo, Akiko Nomachi, Hideaki Harakawa, Tatsuya Ishida, Shunsuke Hasegawa, Katsura Miyashita, Takashi Murakami, Seiji Nagahara, Kazuhiro Takeda, Shoji Mimotogi, Soichi Inoue

Proceedings Volume 7140, 714017 (2008) https://doi.org/10.1117/12.804739

KEYWORDS: Resolution enhancement technologies, Optical lithography, Logic, Lithography, SRAF, Metals, Immersion lithography, Semiconductors, Optical proximity correction, Logic devices

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Proceedings Article | 29 April 2004 Paper

Mix-and-match overlay method by compensating dynamic scan distortion error

Takuya Kono, Manabu Takakuwa, Keita Asanuma, Nobuhiro Komine, Tatsuhiko Higashiki

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.535097

KEYWORDS: Distortion, Scanners, Overlay metrology, Data modeling, Control systems, Error analysis, Databases, Semiconducting wafers, Systems modeling, Semiconductors

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