Mr. Mark L. Drew Profile

Mark L. Drew

Sr. Process Technician

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Author

Publications (3)

Proceedings Article | 22 August 2001 Paper

Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization

John Allgair, David Benoit, Mark Drew, Robert Hershey, Lloyd Litt, Pedro Herrera, Umar Whitney, Marco Guevremont, Ady Levy, Suresh Lakkapragada

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436771

KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Process control, Spectroscopy, Spectroscopes, Metrology, Precision measurement, Control systems

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Proceedings Article | 13 May 1994 Paper

Overlay measurement and analysis of x-ray/optical lithography for mix-and-match device applications

Arnold Yanof, Kevin Cummings, Philip Seese, Matthew Thompson, Mark Drew, Daniel DeMay, James Oberschmidt, Robert Fair, Angela Lamberti

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175807

KEYWORDS: X-rays, Semiconducting wafers, Photomasks, Wafer-level optics, Optical alignment, X-ray optics, Distortion, Overlay metrology, Metrology, X-ray lithography

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Proceedings Article | 4 August 1993 Paper

Automatic feedback control to optimize stepper overlay

Mark Drew, Kevin Kemp

Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.148965

KEYWORDS: Overlay metrology, Semiconducting wafers, Feedback control, Wafer testing, Error analysis, Optical alignment, Photomasks, Manufacturing, Control systems, Databases

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