Mr. Matthias Rudolph Profile

Matthias Rudolph

at Fraunhofer IPMS-CNT

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Author

Publications (6)

Proceedings Article | 21 March 2016 Paper

Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools

Matthias Rudolph, Silvio Esche, Christoph Hohle, Dirk Schumann, Philipp Steinke, Xaver Thrun, Justus von Sonntag

Proceedings Volume 9779, 977919 (2016) https://doi.org/10.1117/12.2220156

KEYWORDS: Advanced cleaning techniques, Mask cleaning, Fluid dynamics, Microfluidics, Semiconducting wafers, Water, Silicon, Photoresist processing, Chemistry, Particles, Scanning electron microscopy, Plasma etching, Photoresist materials, Polymers, Plasma

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Proceedings Article | 8 March 2016 Paper

Patterning and imaging with electrons: assessing multi-beam SEM for e-beam structured CMOS samples

Tomasz Garbowski, Friedhelm Panteleit, Gregor Dellemann, Manuela Gutsch, Christoph Hohle, Elke Reich, Matthias Rudolph, Katja Steidel, Xaver Thrun, Dirk Zeidler

Proceedings Volume 9778, 97781V (2016) https://doi.org/10.1117/12.2225501

KEYWORDS: Electrons, Defect inspection, Semiconducting wafers, Scanning electron microscopy, Inspection, Wafer inspection, Semiconductors, Electron beams, Metals, Tin, Electron beam lithography, Image processing, Sensors

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Proceedings Article | 17 October 2014 Paper

Innovative and water based stripping approach for thick and bulk photoresists

Matthias Rudolph, Dirk Schumann, Xaver Thrun, Silvio Esche, Christoph Hohle

Proceedings Volume 9231, 92310U (2014) https://doi.org/10.1117/12.2069941

KEYWORDS: Photoresist materials, Silicon, Microfluidics, Chemistry, Metals, Water, Semiconductors, Photoresist processing, Fluid dynamics, Plasma

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Proceedings Article | 27 March 2014 Paper

Introduction of an innovative water based photoresist stripping process using intelligent fluids

Matthias Rudolph, Xaver Thrun, Dirk Schumann, Anita Hoehne, Silvio Esche, Christoph Hohle

Proceedings Volume 9051, 90510T (2014) https://doi.org/10.1117/12.2048068

KEYWORDS: Silicon, Semiconducting wafers, Semiconductors, Photoresist processing, Chemistry, Water, Photoresist materials, Contamination, Particles, Microelectromechanical systems

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Proceedings Article | 29 March 2013 Paper

Evaluation of an advanced dual hard mask stack for high resolution pattern transfer

J. Paul, M. Rudolph, S. Riedel, X. Thrun, S. Wege, C. Hohle

Proceedings Volume 8685, 86850V (2013) https://doi.org/10.1117/12.2018247

KEYWORDS: Zirconium dioxide, Etching, Silicon, Photomasks, Silica, Optical lithography, Atomic layer deposition, Surface roughness, Crystals, Plasma

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Proceedings Article | 21 March 2012 Paper

Feasibility study of optical/e-beam complementary lithography

Christoph Hohle, Kang-Hoon Choi, Martin Freitag, Manuela Gutsch, Philipp Jaschinsky, Frank Kahlenberg, Christof Klein, Jan Klikovits, Jan Paul, Matthias Rudolph, Xaver Thrun

Proceedings Volume 8323, 83232C (2012) https://doi.org/10.1117/12.916386

KEYWORDS: Etching, Lithography, Electron beam lithography, Silicon, Semiconducting wafers, Photomasks, 193nm lithography, Electron beam direct write lithography, Beam shaping, Optics manufacturing

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Showing 5 of 6 publications

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