Dr. Ming Fang Profile

Dr. Ming Fang

at Shanghai Institute of Optics and Fine Mechanics

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 9 July 2013 Paper

Optical properties of phase shift on reflection and/or transmission through biaxial anisotropic thin films

Yongqiang Hou, Hongji Qi, Xu Li, Kai He, Ming Fang, Kui Yi, Jianda Shao

Proceedings Volume 8786, 87861W (2013) https://doi.org/10.1117/12.2020147

KEYWORDS: Phase shifts, Thin films, Reflection, Transmittance, Birefringence, Refractive index, Optical properties, Spectroscopic ellipsometry, Scanning electron microscopy, Titanium dioxide

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Proceedings Article | 9 July 2013 Paper

Optimization of the optical near-field distribution of metal multilayer dielectric gratings for pulse compressors

Heyuan Guan, Yunxia Jin, Shijie Liu, Fanyu Kong, Yin Du, Kai He, Ming Fang, Kui Yi, Jianda Shao

Proceedings Volume 8786, 878610 (2013) https://doi.org/10.1117/12.2019443

KEYWORDS: Diffraction, Diffraction gratings, Metals, Dielectrics, Near field optics, Near field, Laser induced damage, Modulation, Silver, Silica

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Proceedings Article | 16 October 2012 Paper

Evolution and control of optical thin film stress

Ming Fang, JingPing Li, HongBo He, Zhengxiu Fan, Qilin Xiao, ZhaoYang Li

Proceedings Volume 8416, 84160K (2012) https://doi.org/10.1117/12.2009292

KEYWORDS: Thin films, Silica, Multilayers, Lithium, Fluctuations and noise, Glasses, Thin film deposition, Optical coatings, Hybrid fiber optics, Precision optics

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Proceedings Article | 15 October 2012 Paper

Stress evolution in evaporated HfO[sub]2[/sub]/SiO[sub]2[/sub] multilayers

Jingping Li, Ming Fang, Hongbo He, Jianda Shao

Proceedings Volume 8417, 84173N (2012) https://doi.org/10.1117/12.971422

KEYWORDS: Silica, Multilayers, In situ metrology, Absorption, Hafnium, Glasses, Crystals, Hybrid fiber optics, Optics manufacturing, Wafer-level optics

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Proceedings Article | 12 January 2012 Paper

Properties of niobium oxide films deposited by pulsed DC reactive magnetron sputtering

Yuchuan Shao, Kui Yi, Ming Fang, Junchao Zhang

Proceedings Volume 8206, 82060M (2012) https://doi.org/10.1117/12.910188

KEYWORDS: Niobium, Oxides, Sputter deposition, Thin films, Laser induced damage, Oxygen, Atomic force microscopy, Photomicroscopy, Resistance, Laser damage threshold

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