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Ofir Gan
at Micron Israel
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Publications (1)
Proceedings Article | 15 February 2012 Paper
Programmed resist sidewall profiles using subresolution binary grayscale masks for Si-photonics applications
Ofir Gan, Paul Allen, Assia Barkai, Peter Buck, Brid Connolly, Harel Frish, Massimiliano Pindo
Proceedings Volume 8249, 82490W (2012) https://doi.org/10.1117/12.907275
KEYWORDS: Photomasks, Calibration, Lithography, Photoresist materials, Transmittance, Semiconducting wafers, Etching, Manufacturing, Data modeling, Silicon
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