Automatic optimization of diffractive structures is of great interest and has potential applications in see-through near-eye displays. Here, we propose an approach of on-demand design of diffractive elements using the physics-driven topological optimization. The topology is iteratively optimized according to the added constrains in dispersion and angle uniformity. The proposed model provides an effective way for the design of complex electromagnetic components that are essentially irregular and out of the box of human’s designing.
The most frequently-used design method for diffractive optical elements (DOE) is scalar diffraction theory, but it is unsuitable for the design of sub-wavelength DOE with large diffraction angles. In this paper, we propose a hybrid iterative design method, which effectively utilizes the large-scale global optimization characteristics of scalar diffraction theory and the accuracy of the rigorous coupled wave analysis (RCWA) theory. A 5*7 beam splitter was designed to verify the proposed model. The design resolution is around 200nm with diffraction angle at 55.61°x61.82°. Several initial solutions were obtained by the non-paraxial scalar diffraction theory. Those solutions were later used as the inputs for continuous optimization through the Genetic Algorithm (GA). The RCWA model was used to analyze the diffraction efficiency and uniformity of the beam splitter DOE. All these structures were fabricated by lithography and duplicated by nano-imprinting process. The optical uniformity of 5*7 beam splitter pattern is improved to 46.30% from its initial values which is bigger than 70%. The testing data from RCWA optimized pattern matches with the design value from scatter plot analysis. This provides an effective method for the design of sub-wavelength DOE with large diffraction angle.
A fast and effective algorithm for designing the diffraction optical element (DOE) with a wide-diffraction angle is presented. DOE had been widely used in many fields in recent years, but there are finite methods which can design DOE with wide-diffraction angle quickly occupying a small quantity of computing resource. By the use of a nonparaxial scalar diffraction equation as the light transmission operator, a modified iterative algorithm is proposed. To verify our algorithm, the checkerboard image, binary image, and gray-scale image are numerically simulated, respectively. The simulation results show that the final variance between the preset image and final pattern is very small, the value is generally lower than 10−5, and the natural images even have a final variance less than 10−12. At the same time, the diffraction efficiency has been significantly increased to be larger than 90%, which indicates that the design method is effective and practical.
One method of realizing color holographic imaging using one thin diffractive optical element (DOE) is proposed. This
method can reconstruct a two-dimensional color image with one phase plate at user defined distance from DOE. For
improving the resolution ratio of reproduced color images, the DOE is optimized by combining Gerchberg-Saxton
algorithm and compensation algorithm. To accelerate the computational process, the Graphic Processing Unit (GPU) is used.
In the end, the simulation result was analyzed to verify the validity of this method.
Methods of generating various illumination patterns remain as an attractive and important micro-optics research area for the development of resolution enhancement in advanced lithography system. In the current illumination system of lithography machine, off-axis illumination is widely used as an effective approach to enhance the resolution and increase the depth of focus (DOF). This paper proposes a novel illumination mode generation unit, which transform conventional mode to double annular shaped radial polarized (DARP) mode for improving the resolution of micro-lithography. Through LightToolsTM software simulation, double annular shaped mode is obtained from the proposed generation unit. The mathematical expressions of the radius variation of inner and outer rings are deduced. The impacts of conventional and dual concentric annular illumination pattern on critical dimension uniformity were simulated on an isolated line, square hole and corner. Lithography performance was compared between DARP illumination mode and corresponding single annular modes under critical dimension of 45nm. As a result, DARP illumination mode can improve the uniformity of aerial image at 45nm node through pitch varied in 300-500 nm to a certain extent.
A polarization phase shifting lateral shearing interferometer based on a polarization beam
splitting plate(PBSP) is proposed. The front surface of the PBSP is coated with polarization beam
splitting film and its back surface is coated with total reflection film. The beam to be tested is split by
the PBSP with an incidence angle of 45° and divided into two mutually perpendicular linearly
polarization beams. Phase shifting can be introduced to the interferometer when the PBSP is combined
with a polarzation temporal or spatial phase shifter. A polarizaiton temporal phase shifting lateral
shearing interferometer system is built up both with the ASAP software and the experiments. The
usefulness of the interferometer is verified.
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