Dr. Reiner Garreis Profile

Dr. Reiner Garreis

Senior Principal Head of Systems Engineering at Carl Zeiss SMT GmbH

SPIE Involvement:

Author

Proceedings Article | 28 March 2017 Presentation + Paper

High-throughput multi-beam SEM: quantitative analysis of imaging capabilities at IMEC-N10 logic node

J. T. Neumann, T. Garbowski, W. Högele, T. Korb, S. Halder, P. Leray, R. Garreis, M. le Maire, D. Zeidler

Proceedings Volume 10145, 101451S (2017) https://doi.org/10.1117/12.2257980

KEYWORDS: Scanning electron microscopy, Inspection, Lithography, Defect inspection, Semiconductors, Electron beam lithography, Electron microscopes, Sensors, Optical lithography, Critical dimension metrology, Image quality, Imaging systems

Read Abstract +

Proceedings Article | 1 April 2013 Paper

Mask effects for high-NA EUV: impact of NA, chief-ray-angle, and reduction ratio

Jens Neumann, Paul Gräupner, Winfried Kaiser, Reiner Garreis, Bernd Geh

Proceedings Volume 8679, 867915 (2013) https://doi.org/10.1117/12.2011455

KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Diffraction, Reflectivity, Extreme ultraviolet, Image quality, Image quality standards, Binary data, Projection systems

Read Abstract +

Proceedings Article | 8 November 2012 Paper

Interactions of 3D mask effects and NA in EUV lithography

Jens Neumann, Paul Gräupner, Winfried Kaiser, Reiner Garreis, Bernd Geh

Proceedings Volume 8522, 852211 (2012) https://doi.org/10.1117/12.2009117

KEYWORDS: Photomasks, Reticles, Reflectivity, Image quality, Semiconducting wafers, Extreme ultraviolet lithography, Diffraction, Nanoimprint lithography, Projection systems, Extreme ultraviolet

Read Abstract +

SPIE Journal Paper | 1 October 2009

Imaging budgets for extreme ultraviolet optics: ready for 22-nm node and beyond

Marc Bienert, Aksel Göhnermeier, Oliver Natt, Martin Lowisch, Paul Gräupner, Tilmann Heil, Reiner Garreis, Koen van Ingen Schenau, Steven Hansen

JM3, Vol. 8, Issue 04, 041509, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238543

KEYWORDS: EUV optics, Extreme ultraviolet, Stray light, Critical dimension metrology, Nanoimprint lithography, Fiber optic illuminators, Photomasks, Optics manufacturing, Printing, Optical proximity correction

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Imaging budgets for EUV optics: ready for 22-nm node and beyond

Marc Bienert, Aksel Göhnemeier, Oliver Natt, Martin Lowisch, Paul Gräupner, Tilmann Heil, Reiner Garreis, Koen van Ingen Schenau, Steve Hansen

Proceedings Volume 7271, 72711B (2009) https://doi.org/10.1117/12.814185

KEYWORDS: Extreme ultraviolet, EUV optics, Nanoimprint lithography, Fiber optic illuminators, Critical dimension metrology, Optics manufacturing, Lithography, Optical proximity correction, Image processing, Solids

Read Abstract +

Proceedings Article | 15 March 2006 Paper

Catadioptric lens design: the breakthrough to hyper-NA optics

Bernhard Kneer, Paul Gräupner, Reiner Garreis, Ralph Kläsges, Heiko Feldmann

Proceedings Volume 6154, 615420 (2006) https://doi.org/10.1117/12.668024

KEYWORDS: Mirrors, Combined lens-mirror systems, Lens design, Coating, Optical design, Polarization, Chemical elements, Reticles, Stray light, Water

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Predictive modeling of advanced illumination pupils used as imaging enhancement for low k1 applications

Tilmann Heil, Paul Graupner, Reiner Garreis, Rafael Egger, Markus Brotsack, Jo Finders, Steve Hansen

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537199

KEYWORDS: Fiber optic illuminators, Optical proximity correction, Lithographic illumination, Computer simulations, Lithography, Data modeling, Critical dimension metrology, Performance modeling, Optical lithography, Linear filtering

Read Abstract +

Proceedings Article | 28 May 2004 Open Access

Optical lithography in the sub-50-nm regime

Donis Flagello, Bill Arnold, Steve Hansen, Mircea Dusa, Robert Socha, Jan Mulkens, Reiner Garreis

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535432

KEYWORDS: Polarization, Reticles, Photoresist materials, Photomasks, Chromium, Optical lithography, Semiconducting wafers, Sodium, Resolution enhancement technologies, Lithography

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 26 June 2003 Paper

Impact of wavefront errors on low k1 processes at extremely high NA

Paul Graeupner, Reiner Garreis, Aksel Goehnermeier, Tilmann Heil, Martin Lowisch, Donis Flagello

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.482694

KEYWORDS: Monochromatic aberrations, Critical dimension metrology, Lithography, Wavefronts, Lawrencium, Spherical lenses, Wavefront aberrations, Zernike polynomials, Systems modeling, 193nm lithography

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Solutions for printing sub-100-nm contacts with ArF

Paul Graeupner, Aksel Goehnermeier, Martin Lowisch, Reiner Garreis, Donis Flagello, Steven Hansen, Robert Socha, Carsten Koehler

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474569

KEYWORDS: Photomasks, Printing, Nanoimprint lithography, Image processing, Lithography, Image filtering, Reticles, Binary data, Monochromatic aberrations, Electroluminescence

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Performance of an i-line step-and-scan system for sub-0.25-um mix-and-match applications

Peter van Oorschot, Bert Koek, Jeroen van der Spek, Eric Stuiver, Hans Franken, Herman Botter, Reiner Garreis

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310771

KEYWORDS: Deep ultraviolet, Distortion, Semiconducting wafers, Monochromatic aberrations, Reticles, Fiber optic illuminators, Control systems, Lamps, Lithography, Photoresist materials

Read Abstract +

Proceedings Article | 27 January 1997 Paper

PRISM: Hyperspectral spaceborne imager for land processes research

Yves Delclaud, Jean-Yves Labandibar, Umberto Del Bello, Roland Meynart, Reiner Garreis, Giorgio Adami

Proceedings Volume 2957, (1997) https://doi.org/10.1117/12.265426

KEYWORDS: Prisms, Calibration, Mirrors, Satellites, Short wave infrared radiation, Imaging systems, Spectroscopy, Sensors, Telescopes, Space telescopes

Read Abstract +

Proceedings Article | 1 May 1991 Paper

90 degree optical hybrid for coherent receivers

Reiner Garreis

Proceedings Volume 1522, (1991) https://doi.org/10.1117/12.46097

KEYWORDS: Beam splitters, Polarization, Phase shifts, Wave plates, Optical communications, Oscillators, Hybrid optics, Receivers, Astronomical imaging, Epitaxial lateral overgrowth

Read Abstract +

Showing 5 of 13 publications

Conference Committee Involvement (1)

SPIE Lithography Asia - Korea

13 October 2010 | n/a, Republic of Korea

Keywords/Phrases

Search In:

Publication Years