Dr. Roy Anunciado Profile

Dr. Roy Anunciado

at ASML Netherlands BV

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Author

Publications (9)

Proceedings Article | 12 November 2024 Presentation + Paper

Pattern selection strategy by clustering for logic EPE monitoring

Roy Anunciado, Konstantin Nechaev, Reza Sahraeian, Jeroen Schouwenberg, Guillaume Schelcher, Shubhankar Das, Wei Peng, Stefan van der Sanden, Harm Dillen

Proceedings Volume 13215, 1321508 (2024) https://doi.org/10.1117/12.3034649

KEYWORDS: Design, Logic, Optical proximity correction, Critical dimension metrology, Logic devices

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Proceedings Article | 10 April 2024 Presentation + Paper

Feature grouping to enable edge placement error-aware process control in multi-feature logic use case

Guillaume Schelcher, Marsil Athayde, Stijn Schoofs, Jeff Hsia, Zuan Khalik, Fahong Li, Konstantin Nechaev, Reza Sahraeian, Amir-Hossein Tamaddon, Victor Blanco, Stefan van der Sanden, Yichen Zhang, Roy Anunciado, Harm Dillen, Philippe Leray

Proceedings Volume 12955, 129550O (2024) https://doi.org/10.1117/12.3010421

KEYWORDS: Semiconducting wafers, Overlay metrology, Cross validation, Process control, Logic, Metrology, Simulations, Scanning electron microscopy, Lithography

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Proceedings Article | 30 April 2023 Presentation

The edge placement error characterization and optimization for advanced logic and DRAM nodes

Harm Dillen, Wim Tel, Jaap Karssenberg, Jan Mulkens, Roy Anunciado, Yichen Zhang, Konstantin Nechaev, Zuan Khalik

Proceedings Volume 12496, 124960O (2023) https://doi.org/10.1117/12.2658832

KEYWORDS: Overlay metrology, Logic, Optical proximity correction, Metrology, Stochastic processes, Semiconductors, Semiconductor manufacturing, Scanners, Manufacturing, Line edge roughness

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Proceedings Article | 1 December 2022 Presentation + Paper

Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPE

Roy Anunciado, Jisun Lee, Ellaheh Barzegar, Stefan van der Sanden, Guillaume Schelcher, Stijn Schoofs

Proceedings Volume 12292, 122920J (2022) https://doi.org/10.1117/12.2637772

KEYWORDS: Line edge roughness, Etching, Semiconducting wafers, Optical lithography, Critical dimension metrology, Amorphous silicon, Scanning electron microscopy, Dielectrics, Overlay metrology, Photomasks

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Proceedings Article | 13 March 2018 Paper

Assessment of local variability by high-throughput e-beam metrology for prediction of patterning defect probabilities

Fuming Wang , Stefan Hunsche, Roy Anunciado, Antonio Corradi , Hung Yu Tien, Peng Tang, Junwei Wei, Yongjun Wang, Wei Fang, Patrick Wong, Anton van Oosten, Koen van Ingen Schenau, Bram Slachter

Proceedings Volume 10585, 1058525 (2018) https://doi.org/10.1117/12.2297603

KEYWORDS: Semiconducting wafers, Stochastic processes, Scanning electron microscopy, Metrology, Electron beam lithography, Photomasks, Inspection, Critical dimension metrology, Optical proximity correction, Deep ultraviolet

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Proceedings Article | 28 March 2017 Paper

Efficient hybrid metrology for focus, CD, and overlay

W. T. Tel, B. Segers, R. Anunciado, Y. Zhang, P. Wong, T. Hasan, C. Prentice

Proceedings Volume 10145, 101452E (2017) https://doi.org/10.1117/12.2257965

KEYWORDS: Metrology, Overlay metrology, Critical dimension metrology, Optical lithography, Scanners, Semiconductors, Semiconducting wafers, Etching, Sensors, Reticles

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Proceedings Article | 15 March 2016 Paper

CDU budget breakdown as a diagnostic method for imaging sensitivity in HVM

Young Ki Kim, Pavan Samudrala, Juan-Manuel Gomez, Peter Nikolsky, Roy Anunciado, Maria Barkelid, Shawn Lee, Ye Tian, Justin Hanson

Proceedings Volume 9780, 97801Q (2016) https://doi.org/10.1117/12.2214123

KEYWORDS: Semiconducting wafers, Reticles, Critical dimension metrology, Scanners, Photomasks, Metrology, Laser processing, Laser scanners, 3D scanning, Laser metrology

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Proceedings Article | 8 March 2016 Paper

Process window limiting hot spot monitoring for high-volume manufacturing

Marinus Jochemsen, Roy Anunciado, Vadim Timoshkov, Stefan Hunsche, Xinjian Zhou, Chris Jones, Neal Callan

Proceedings Volume 9778, 97781R (2016) https://doi.org/10.1117/12.2219906

KEYWORDS: Semiconducting wafers, Data modeling, Metrology, Defect detection, High volume manufacturing, Deep ultraviolet, Inspection, Detection and tracking algorithms, Process control, Etching, Optical lithography, Scanning electron microscopy, Sensors, Lithography, Scanners

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Proceedings Article | 2 April 2014 Paper

CD uniformity optimization at volume ramp up stage for new product introduction

Jin-Soo Kim, Won-Kwang Ma, Young-Sik Kim, Myoung-Soo Kim, Won-Taik Kwon, Sung-Ki Park, Peter Nikolsky, Marian Otter, Maryana Escalante Marun, Roy Anunciado, Kyu-Tae Sun, Greet Storms, Ewould van West

Proceedings Volume 9050, 905037 (2014) https://doi.org/10.1117/12.2057390

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Yield improvement, Semiconductors, Etching, Photoresist processing, Optical lithography, Process control, Overlay metrology, Manufacturing

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Showing 5 of 9 publications

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