Dr. Ruben Maas Profile

Dr. Ruben Maas

at ASML Netherlands BV

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Publications (7)

Proceedings Article | 10 April 2024 Presentation + Paper

Holistic assessment and control of total CDU

Jo Finders, Vidya Vaenkatesan, Luc van Kessel, Ruben Maas, Tasja van Rhee, Varun Kakkar, Dominykas Gustas, Eelco van Setten, Claire van Lare

Proceedings Volume 12953, 1295303 (2024) https://doi.org/10.1117/12.3010890

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Reticles, Scanners, Extreme ultraviolet lithography, Atomic force microscopy, 3D mask effects, Monte Carlo methods, Metrology, Simulations

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SPIE Journal Paper | 13 October 2022

Predictive compact model for stress-induced on-product overlay correction

Huaichen Zhang, Cyrus Tabery, Ruben Maas, Oleksandr Khodko, Victor Blanco Carballo, Eren Canga, Filip Schleicher

JM3, Vol. 21, Issue 04, 043201, (October 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.043201

KEYWORDS: Semiconducting wafers, Overlay metrology, Distortion, Thin films, Optical alignment, Scanning electron microscopy, Sensors, Photomasks, Data modeling, Optical parametric oscillators

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Proceedings Article | 27 September 2021 Presentation

High-NA EUVL exposure tool: key advantages and program status

Jan Van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Thomas Stammler, Kars Troost

Proceedings Volume 11854, 1185403 (2021) https://doi.org/10.1117/12.2600951

KEYWORDS: Extreme ultraviolet lithography, Sensors, Scanners, Projection systems, Printing, Optical lithography, Mirrors, Lens design, High volume manufacturing, Device simulation

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Proceedings Article | 22 February 2021 Presentation

High-NA EUV lithography exposure tool: key advantages and program progress

Jan Van Schoot, Sjoerd Lok, Eelco Van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Thomas Stammler

Proceedings Volume 11609, 1160905 (2021) https://doi.org/10.1117/12.2583640

KEYWORDS: Extreme ultraviolet lithography, Sensors, Scanners, Projection systems, Printing, Optical lithography, Mirrors, Lens design, High volume manufacturing, Device simulation

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Proceedings Article | 7 January 2021 Presentation + Paper

High-NA EUV lithography exposure tool: advantages and program progress

Jan Van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser

Proceedings Volume 11517, 1151712 (2021) https://doi.org/10.1117/12.2572932

KEYWORDS: Extreme ultraviolet lithography, High volume manufacturing, Scanners, Lens design, Sensors, Printing, Optical lithography, Device simulation, Projection systems, Buildings

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Proceedings Article | 26 March 2019 Paper

Analyze line roughness sources using power spectral density (PSD)

Lingling Pu, Teng Wang, Thomas Huisman, Ruben Maas, Maikel Goosen, Harm Dillen, Philippe Leray, Wei Fang

Proceedings Volume 10959, 109592W (2019) https://doi.org/10.1117/12.2516570

KEYWORDS: Scanning electron microscopy, Line edge roughness, Semiconducting wafers, Monte Carlo methods, Image segmentation, Semiconductors, Extreme ultraviolet, Optical simulations, Solids, Metrology

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SPIE Journal Paper | 11 July 2018 Open Access

Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists

Ruben Maas, M.-Claire van Lare, Gijsbert Rispens, Sander Wuister

JM3, Vol. 17, Issue 04, 041003, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041003

KEYWORDS: Monte Carlo methods, Quantum efficiency, Photons, Stochastic processes, Data modeling, Extreme ultraviolet lithography, Particles, Performance modeling, Absorption, Extreme ultraviolet

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