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Ruty Katz
at Applied Materials Ltd
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Publications (2)
Proceedings Article | 5 April 2007 Paper
Advanced edge roughness measurement application for mask metrology
Thomas Marschner, Jan Richter, Uwe Dersch, Amit Moran, Ruthy Katz, David Chase, Reuven Falah, Thomas Coleman
Proceedings Volume 6518, 65181R (2007) https://doi.org/10.1117/12.712530
KEYWORDS: Photomasks, Line edge roughness, Computer aided design, Metrology, Signal processing, Critical dimension metrology, Line width roughness, Semiconducting wafers, Edge roughness, Scanning electron microscopy
Proceedings Article | 9 November 2005 Paper
Advanced edge roughness measurement application for mask metrology
D. Chase, R. Kris, R. Katz, A. Tam, L. Gershtein, R. Falah, N. Wertsman
Proceedings Volume 5992, 59924N (2005) https://doi.org/10.1117/12.632439
KEYWORDS: Photomasks, Metrology, Edge roughness, Manufacturing, Reticles, Critical dimension metrology, Scanning electron microscopy, Integrated circuits, Line edge roughness, Photomask technology
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