Dr. Steve S. Putna Profile

Dr. Steve S. Putna

Engineering Manager at Intel Corp

SPIE Involvement:

Author

Proceedings Article | 17 April 2014 Paper

Investigation of novel inorganic resist materials for EUV lithography

Marie Krysak, James Blackwell, Steve Putna, Michael Leeson, Todd Younkin, Shane Harlson, Kent Frasure, Florian Gstrein

Proceedings Volume 9048, 904805 (2014) https://doi.org/10.1117/12.2046677

KEYWORDS: Extreme ultraviolet lithography, Nanoparticles, Extreme ultraviolet, Optical lithography, Metals, Spectroscopy, FT-IR spectroscopy, Scanning electron microscopy, Ultraviolet radiation, Particles

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Proceedings Article | 8 April 2011 Paper

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

E. Steve Putna, Todd Younkin, Michael Leeson, Roman Caudillo, Terence Bacuita, Uday Shah, Manish Chandhok

Proceedings Volume 7969, 79692K (2011) https://doi.org/10.1117/12.879641

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Photoresist materials, Photoresist developing, Materials processing, Lithography, Etching, Scanning electron microscopy

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Proceedings Article | 23 March 2010 Paper

Aerial image improvements on the Intel MET

Roman Caudillo, Todd Younkin, Steve Putna, Alan Myers, Yashesh Shroff, Terence Bacuita, Grant Kloster, Erik Sohmen

Proceedings Volume 7636, 76363I (2010) https://doi.org/10.1117/12.849142

KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Mirrors, Photoresist materials, Semiconducting wafers, Printing, Modulation, Photomasks, Photoresist developing

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Proceedings Article | 20 March 2010 Paper

Printability of extreme ultraviolet lithography mask pattern defects for 22-40 nm half-pitch features

Grant Kloster, Ted Liang, Todd Younkin, Ernisse Putna, Roman Caudillo, Il-Seok Son

Proceedings Volume 7636, 76360M (2010) https://doi.org/10.1117/12.845740

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Scanning electron microscopy, Line width roughness, Optical lithography, Photoresist materials, Lithography, Metrology

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Proceedings Article | 20 March 2010 Paper

EUV mask defect inspection and defect review strategies for EUV pilot line and high volume manufacturing

Y. David Chan, Abbas Rastegar, Henry Yun, E. Steve Putna, Stefan Wurm

Proceedings Volume 7636, 76361D (2010) https://doi.org/10.1117/12.847371

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Defect inspection, Optical inspection, Particles, Reflectivity, Manufacturing, Deep ultraviolet

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Proceedings Article | 20 March 2010 Paper

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

E. Steve Putna, Todd Younkin, Roman Caudillo, Manish Chandhok

Proceedings Volume 7636, 76360P (2010) https://doi.org/10.1117/12.842408

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Standards development, Lithography, Photoresist processing, Optical lithography, Photoresist materials, Lithographic illumination, Lead

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Proceedings Article | 1 April 2009 Paper

Aryl sulfonates as neutral photoacid generators (PAGs) for EUV lithography

Robert Sulc, James Blackwell, Todd Younkin, E. Steve Putna, Katherine Esswein, Antonio DiPasquale, Ryan Callahan, Hideaki Tsubaki, Tooru Tsuchihashi

Proceedings Volume 7273, 72733R (2009) https://doi.org/10.1117/12.814279

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photoresist materials, Extreme ultraviolet, Optical lithography, Line width roughness, Molecules, Ionization, Semiconducting wafers, Lithium

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Proceedings Article | 1 April 2009 Paper

EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs

E. Steve Putna, Todd Younkin, Manish Chandhok, Kent Frasure

Proceedings Volume 7273, 72731L (2009) https://doi.org/10.1117/12.814191

KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Polymers, Photoresist processing, Standards development, Optical lithography, Glasses, Lithography, Photoresist materials

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Proceedings Article | 18 March 2009 Paper

Demonstration of full-field patterning of 32 nm test chips using EUVL

Gilroy Vandentop, Manish Chandhok, Ernisse Putna, Todd Younkin, James Clarke, Steven Carson, Alan Myers, Michael Leeson, Guojing Zhang, Ted Liang, Tetsunori Murachi

Proceedings Volume 7271, 727116 (2009) https://doi.org/10.1117/12.814436

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

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Proceedings Article | 29 March 2006 Paper

All-organic non-PFOS nonionic photoacid generating compounds with functionalized fluoroorganic sulfonate motif for chemically amplified resists

Ramakrishnan Ayothi, Yi Yi, Christopher Ober, Steve Putna, Wang Yueh, Heidi Cao

Proceedings Volume 6153, 61530J (2006) https://doi.org/10.1117/12.656500

KEYWORDS: Lithography, Line edge roughness, Electron beam lithography, Chromophores, Carbon, Fluorine, Absorption, Polymers, Scanning electron microscopy, Chemically amplified resists

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Proceedings Article | 12 June 2003 Paper

Intel benchmarking and process integration of 157-nm resists

James Powers, Jeanette Roberts, Paul Zimmerman, Robert Meagley, E. Steve Putna, Uday Shah

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483730

KEYWORDS: Etching, Silicon, Line width roughness, Dry etching, Absorbance, Photoresist materials, Imaging systems, Electroluminescence, Optical lithography, Lithography

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Showing 5 of 11 publications

Conference Committee Involvement (9)

Advances in Patterning Materials and Processes XXXVII

24 February 2020 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXVI

25 February 2019 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXV

27 February 2018 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXIV

28 February 2017 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXVI

23 February 2009 | San Jose, California, United States

Showing 5 of 9 Conference Committees

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