Mr. Shingo Yoshikawa Profile

Shingo Yoshikawa

Mask Div. Senior Technical Director/Principal Eng. at Dai Nippon Printing Co., Ltd

Publications (12)

Proceedings Article | 12 November 2024 Presentation + Paper

Evaluating high-throughput mask systems for mainstream technology applications

Martin Glimtoft, Robert Eklund, Mikael Wahlsten, Mats Rosling, Anders Svensson, Youngjin Park, Yukihiro Fujimura, Izumi Hotei, Mei Ebisawa, Yusuke Shoji, Shingo Yoshikawa

Proceedings Volume 13216, 132160L (2024) https://doi.org/10.1117/12.3034858

KEYWORDS: Photomasks, Deep ultraviolet, Printing, Design, Laser applications, Semiconductors, Industry, Semiconductor lasers, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 10 April 2024 Poster

Exploring the potential of EB lithography in EUV photomask manufacturing

Mei Ebisawa, Tsukasa Abe, Yukihiro Fujimura, Izumi Hotei, Masataka Yamaji, Yasutaka Morikawa, Tatsuya Tomita, Naoya Hayashi, Shingo Yoshikawa

Proceedings Volume PC12953, PC1295313 (2024) https://doi.org/10.1117/12.3013224

KEYWORDS: Extreme ultraviolet, Lithography, Photoresist processing, Photomasks, Manufacturing, High volume manufacturing, Extreme ultraviolet lithography, Semiconductors, Logic, Semiconductor manufacturing

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Proceedings Article | 22 November 2023 Presentation

Ultimate resolution challenge for high-precision EUV mask by using MBMW technology

Shingo Yoshikawa, Tsukasa Abe, Yukihiro Fujimura, Mei Ebisawa, Izumi Hotei, Issei Sakai, Masataka Yamaji, Yasutaka Morikawa, Tatsuya Tomita, Koji Ichimura, Naoya Hayashi

Proceedings Volume PC12751, PC127510U (2023) https://doi.org/10.1117/12.2688952

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconductor manufacturing, Photomasks, Photomask technology, Manufacturing, Lithography, Electron beams

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Proceedings Article | 29 September 2023 Paper

Study of photomask manufacture process based on AI technology

Hiroshi Nakata, Ikuo Kikuchi, Noriko Baba, Maiko Hikichi, Shingo Yoshikawa

Proceedings Volume 12915, 129150P (2023) https://doi.org/10.1117/12.2684945

KEYWORDS: Machine learning, Photomasks, Manufacturing, Data modeling, Particles, Artificial intelligence, Vacuum chambers

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Proceedings Article | 15 September 2022 Poster

High-precision EUV mask process development

Shingo Yoshikawa

Proceedings Volume PC12325, PC123250Q (2022) https://doi.org/10.1117/12.2656163

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Proceedings Article | 23 October 2015 Paper

The capability of lithography simulation based on MVM-SEM system

Shingo Yoshikawa, Nobuaki Fujii, Koichi Kanno, Hidemichi Imai, Katsuya Hayano, Hiroyuki Miyashita, Soichi Shida, Tsutomu Murakawa, Masayuki Kuribara, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Daisuke Hara, Linyong Pang

Proceedings Volume 9635, 96351X (2015) https://doi.org/10.1117/12.2197818

KEYWORDS: Lithography, Photomasks, Scanning electron microscopy, Semiconducting wafers, 3D acquisition, 3D metrology, Defect inspection, Defect detection, Manufacturing, Standards development, Critical dimension metrology, Extreme ultraviolet, Bridges, Image analysis, 193nm lithography

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Proceedings Article | 23 October 2015 Paper

Automatic classification and defect verification based on inspection technology with lithography simulation

Masaya Kato, Hideki Inuzuka, Takeshi Kosuge, Shingo Yoshikawa, Kayoko Kanno, Hidemichi Imai, Hiroyuki Miyashita, Anthony Vacca, Peter Fiekowsky, Dan Fiekowsky

Proceedings Volume 9635, 96351W (2015) https://doi.org/10.1117/12.2197814

KEYWORDS: Photomasks, Inspection, Critical dimension metrology, Opacity, Lithography, Semiconducting wafers, Source mask optimization, Reticles, Optical proximity correction, Bridges

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Proceedings Article | 9 July 2015 Paper

Study of defect verification based on lithography simulation with a SEM system

Proceedings Volume 9658, 96580V (2015) https://doi.org/10.1117/12.2197617

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, 193nm lithography, Defect inspection, Optical lithography, Signal to noise ratio, Source mask optimization

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Proceedings Article | 9 July 2015 Paper

Development of new high transmission eaPSM for Negative Tone Development process on wafer

Takashi Adachi, Ayako Tani, Yukihiro Fujimura, Shingo Yoshikawa, Katsuya Hayano, Yasutaka Morikawa, Yoichi Miura, Hiroyuki Miyashita

Proceedings Volume 9658, 96580P (2015) https://doi.org/10.1117/12.2197611

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Inspection, Transmittance, Excimer lasers, Electroluminescence, Phase shifts, Image processing, Opacity

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Proceedings Article | 21 October 2014 Paper

Performance of GFIS mask repair system for various mask materials

Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka, Shingo Yoshikawa, Koichi Kanno, Hiroyuki Miyashita, Naoya Hayashi

Proceedings Volume 9235, 92350F (2014) https://doi.org/10.1117/12.2069435

KEYWORDS: Photomasks, Etching, Scanning electron microscopy, Ions, Quartz, Semiconducting wafers, Critical dimension metrology, Phase shifts, Nitrogen

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Proceedings Article | 28 July 2014 Paper

Proximity corrected accurate in-die registration metrology

M. Daneshpanah, F. Laske, M. Wagner, K.-D. Roeth, S. Czerkas, H. Yamaguchi, N. Fujii, S. Yoshikawa, K. Kanno, H. Takamizawa

Proceedings Volume 9256, 92560F (2014) https://doi.org/10.1117/12.2072074

KEYWORDS: Photomasks, Metrology, Semiconducting wafers, Model-based design, Near field optics, Reticles, Autoregressive models, Overlay metrology, Systems modeling, Logic

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Proceedings Article | 30 June 2012 Paper

A study of hot spot measurement on WLCD

Hidemichi Imai, Shingo Yoshikawa, Hideyoshi Takamizawa, Ute Buttgereit, Thomas Thaler

Proceedings Volume 8441, 844107 (2012) https://doi.org/10.1117/12.978706

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, 193nm lithography, Process control, Current controlled current source, Optical lithography, Extreme ultraviolet lithography, Lithography

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Showing 5 of 12 publications

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