We have developed strongly-segregating chemically tailored block copolymers (BCPs), a series of post-functionalized polystyrene-b-polymethacrylates that can form sub-10 nm perpendicular lamellae on thin films by thermal annealing. The desired BCPs successfully synthesized by thiol-epoxy reaction of poly(glycidyl methacrylate)s, a partial component of polystyrene-b-polymethacrylates, with trifluoroethane thiol. Microdomains in the obtained BCP thin films were vertically oriented by tuning the Neutral Layer, and highly aligned and distinct vertical lamellae with L0=15.1 nm were successfully obtained on the guide pattern substrate for DSA.
We have developed strongly-segregating chemically tailored block copolymers (BCPs), a series of post-functionalized polystyrene-b-polymethacrylates capable of forming sub-10 nm perpendicular lamellae on thin films with ease by thermal annealing. The desired block copolymers based on polystyrene-b-polymethacrylates were successfully synthesized by the post-functionalization of poly(glycidyl methacrylate)s and thiol derivatives via thiol-epoxy reaction. To work towards clarifying the essential key to the perpendicular orientation of microdomains, we studied the correlation between the primary structures based on the new concept of molecular design and microphase-separated nanostructures in bulk and thin films.
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