Shinya Hori
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485057
KEYWORDS: Critical dimension metrology, Photoresist processing, Coating, Lithography, Line edge roughness, Fluorine, Control systems, Contamination, Polymers, Semiconducting wafers

Proceedings Article | 16 July 2002 Paper
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473505
KEYWORDS: Optical lithography, Lithography, Satellites, Coating, Semiconductors, Chemically amplified resists, Semiconducting wafers, Polymers, Thin films, Metrology

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