Dr. Shu Shimada Profile

Dr. Shu Shimada

at Dai Nippon Printing Co Ltd

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Author

Publications (4)

Proceedings Article | 14 May 2007 Paper

Methodology of adhesive energy for photomask fabrication using scanning probe microscopy

S. Shimada, T. Shimomura, K. Yoshida, M. Kurihara, H. Mohri, N. Hayashi

Proceedings Volume 6607, 660728 (2007) https://doi.org/10.1117/12.728991

KEYWORDS: Adhesives, Chromium, Scanning probe microscopy, Interfaces, Photomasks, Sensors, Quartz, Semiconducting wafers, Scanning electron microscopy, Metals

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Proceedings Article | 11 May 2007 Paper

A new model of haze generation and storage-life-time estimation for mask

S. Shimada, N. Kanda, N. Takahashi, H. Nakajima, H. Tanaka, H. Ishii, Y. Shoji, M. Ohtsuki, A. Naitoh, N. Hayashi

Proceedings Volume 6607, 660706 (2007) https://doi.org/10.1117/12.729258

KEYWORDS: Air contamination, Ions, Photomasks, Adsorption, Inspection, Quartz, Semiconducting wafers, Nitrogen, Solids, Laser damage threshold

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Proceedings Article | 20 October 2006 Paper

Mechanism of megasonic damages for micropatterns

Y. Suwa, S. Shimada, A. Shigihara, H. Ishii, Y. Shoji, M. Otsuki, A. Naito, S. Sasaki, H. Mohri, N. Hayashi

Proceedings Volume 6349, 63492X (2006) https://doi.org/10.1117/12.690558

KEYWORDS: SRAF, Acoustics, Cavitation, Inspection, Particles, Solids, Interfaces, Mask making, Photomasks, Device simulation

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Proceedings Article | 20 October 2006 Paper

A new model of haze generation and storage-life-time estimation for mask

S. Shimada, N. Kanda, N. Takahashi, H. Nakajima, H. Tanaka, H. Ishii, Y. Shoji, M. Otsuki, A. Naito, N. Hayashi

Proceedings Volume 6349, 63491H (2006) https://doi.org/10.1117/12.688936

KEYWORDS: Air contamination, Ions, Photomasks, Adsorption, Inspection, Quartz, Semiconducting wafers, Nitrogen, Solids, Laser damage threshold

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