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Silvio Esche
Product Manager at intelligent Fluids GmbH
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Publications (3)
Proceedings Article | 21 March 2016 Paper
Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools
Matthias Rudolph, Silvio Esche, Christoph Hohle, Dirk Schumann, Philipp Steinke, Xaver Thrun, Justus von Sonntag
Proceedings Volume 9779, 977919 (2016) https://doi.org/10.1117/12.2220156
KEYWORDS: Advanced cleaning techniques, Mask cleaning, Fluid dynamics, Microfluidics, Semiconducting wafers, Water, Silicon, Photoresist processing, Chemistry, Particles, Scanning electron microscopy, Plasma etching, Photoresist materials, Polymers, Plasma
Proceedings Article | 17 October 2014 Paper
Innovative and water based stripping approach for thick and bulk photoresists
Proceedings Volume 9231, 92310U (2014) https://doi.org/10.1117/12.2069941
KEYWORDS: Photoresist materials, Silicon, Microfluidics, Chemistry, Metals, Water, Semiconductors, Photoresist processing, Fluid dynamics, Plasma
Proceedings Article | 27 March 2014 Paper
Introduction of an innovative water based photoresist stripping process using intelligent fluids
Matthias Rudolph, Xaver Thrun, Dirk Schumann, Anita Hoehne, Silvio Esche, Christoph Hohle
Proceedings Volume 9051, 90510T (2014) https://doi.org/10.1117/12.2048068
KEYWORDS: Silicon, Semiconducting wafers, Semiconductors, Photoresist processing, Chemistry, Water, Photoresist materials, Contamination, Particles, Microelectromechanical systems
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