In this study, the effect of high energy proton implantation in strain coupled Sub-monolayer (SML) and Stranski Krastanov (SK) quantum dot (QD) heterostructures have been investigated. The incident proton energy has been varied from 2 MeV to 5 MeV at a fixed proton dose of 1E-12 ions/cm2. Ion beam irradiation has used to demonstrate the ex-situ tailoring of structural morphology, vertical strain coupling and optoelectronic interaction between the seed and top layer QDs of the coupled SK-SML QD heterostructure by utilizing the precise control over depth-wise defect alteration and the size modulation. The optical and structural properties have been studied through photoluminescence (PL) spectroscopy and high-resolution X-ray diffraction (HR-XRD) measurements. The penetration depth can be controlled by proton energy which influences the intensity and shifting in luminescence spectra. Red shift in PL emission wavelength has been observed for ion implanted samples as compared to as-grown samples. Subsequent power dependent photoluminescence (PDPL) study has been carried out to investigate the preferential photogenerated carrier transitions between ground and excited states of the aforementioned coupled QDs. Further, the quantum carrier confinement has been investigated through temperature dependent PL (TDPL) spectra. Strain profile analysis and crystalline quality investigation have been carried out through rocking curve analysis in (004) plane. The improved strain profile and morphology have been observed in ion implanted samples as compared to as-grown sample. The proton energy can directly control the intermixing within the dots and materials around the QDs.
We present a unique growth technique for molecular beam epitaxial growth of multi-layer InGaAs/GaAs quantum dots on Ge substrate. The optical and structural properties are compared with similar heterostructure grown on GaAs with the aim of achieving similar optical efficiency and structural homogeneity. An interesting phenomenon of increase in integrated photoluminescence (PL) intensity at high temperatures due to thermally assisted inter-dot carrier transfer is investigated using a coupled model and activation energy and quantum efficiency of dots is calculated for grown samples. The optical properties measured using steady state photoluminescence (PL) is found to quite similar to reference sample on GaAs substrate. Structural comparison performed using TEM shows good agreement between samples on Ge and GaAs substrate. H- ion-implantation is done on as-grown samples which further enhances optical properties.
In this work, we have proposed two ex-situ treatments to annihilate bulk defects and non-radiative surface states in MBE grown AlGaN nanowires on silicon substrate. Vertically aligned nanowires were grown by molecular beam epitaxy (Veeco Gen II) system, equipped with RF plasma source for incorporating nitrogen, at a substrate temperature of 8000C. The nanowires were structurally characterized by SEM images and an areal density of 3.8×109 nanowires-cm-2 was calculated. The peak emission wavelength was measured to be 343nm at 19K from photoluminescence (PL) measurements. The as-grown nanowires were implanted with H- ions at various energies and fluences. A 2-fold increase in PL intensity without any wavelength shift was found in sample with irradiated energy of 3 MeV and a fluency of 1×1012 ions-cm-2. X-Ray diffraction measurements on (002) diffraction peak give an FWHM of 1440 arc-sec for ionimplanted samples as compared to 1872 arc-sec for as-grown nanowires indicating an improvement in crystalline quality. The nanowires were further treated in UV ozone environment for 25 minutes and an increase of 1.6 times in PL intensity was found without any wavelength shift. Both recipes were combined to get an effective increase of 3 times in PL intensity indicating the annihilation of bulk defects and non-radiative surface states. Hence, these treatments can be used to reduce non-radiative states and can be used to increase in radiative efficiency of AlGaN nanowires for applications in UV LEDs.
In this work, we demonstrate two times enhancement in NEDT response of InAs/InGaAs/ GaAs dot-in-the-well (DWELL) structure implanted with hydrogen ions of 3 MeV energy and 5×1012 ions/cm2 fluence. Low temperature photoluminescence study shows emission peak at 1130 nm which corresponds to ground state transition between conduction to valence band. PL enhancement is observed in all hydrogen implanted samples indicating the passivation of defects/dislocations in the vicinity of QDs and surrounding layer. The spectral response peak was observed at 5 μm corresponding to the intersubband transition and measured upto 76 K. Next, 320×256 format infrared FPA was fabricated involving multistage lithography, wet etching, metal stack and bump deposition. The NEDT parameter, which represents minimum temperature difference that FPA based camera can resolve, improved from 239 mK( as-grown) to 129 mK ( implanted sample).
In this work, we investigated the effects of phosphorus ions implantation on InAs/GaAs QDs by varying the fluences from 8× 1011 to 1×1013 ions/cm2 at a fixed energy of 50 keV. Temperature dependent photoluminescence (PL) study shows a suppression of emission efficiency with the increase of fluence of implanted ions, attributed to the generation of defects/dislocations near around QDs acting as trapping centers for photocarriers. All the implanted samples demonstrated degradation in activation energy from 184 meV (as-grown) to 73 meV (highest fluence sample) indicating weaker carrier confinement in QDs. Implantation also resulted 40 nm blue shift in PL emission wavelength which is caused due to the atomic intermixing between QDs and surrounding materials. Rocking curves plotted from the double crystal X-ray diffraction study, depict a vanishing trend of satellite peaks with the increase of fluence of implanted ions, resulting from the loss of interface sharpness due to interdiffusion.
We have investigated the effect of implantation of Lithium ions of varying energies from 20 keV to 50 keV at fixed dose 2 × 1012 ions/cm2 on InAs/GaAs QDs. Temperature dependent (15K-300K) photoluminescence (PL) study was carried for all samples. Implantation resulted consistent degradation in PL efficiency with rise in energy of ions. The same trend was also observed while varying the fluence at fixed energy. Suppression in PL intensity might be due to creation of defects/damage profile in the vicinity of the QDs which act as trapping centers for photocarriers. Implantation also resulted in decrease of activation energies from 230 meV (as-grown) to 35 meV (50 keV) indicating reduced carriers confinement in QDs. The 50 keV sample demonstrated the mild red shift in PL spectra which is probably originated from atomic interdiffussion between dots and barrier layer caused by local heat generation.
Self-assembled In(Ga)As/GaAs quantum dot infrared photodetectors (QDIPs) have promising applications in the midwavelength infrared and long-wavelength infrared regions for various defense and space application purposes. It has been demonstrated that the performance of QDIPs has improved significantly by using architectures such as dots-in-awell, different combinational capping or post growth treatment with high energy hydrogen ions. In this work, we enhanced the electrical properties InGaAs/GaAs using high energy proton implantation. Irradiation with proton resulted suppression in field assisted tunnelling of dark current by three orders for implanted devices. Photoluminescence (PL) enhancement was observed up to certain dose of protons due to eradication of as-grown defects and non radiative recombination centers. In addition, peak detectivity (D*) increased up to two orders of magnitude from 6.1 x108 to 1.0 × 1010 cm-Hz1/2/W for all implanted devices.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.