Mr. Takahiro Hiromatsu Profile

Takahiro Hiromatsu

at HOYA Corp

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 13 November 2024 Poster

Study of high-contrast PCAR for lithographic performance improvement on EUV blanks

Kei Yamamoto, Kotaro Takahashi, Kazuki Takeda, Hideo Nagasaki, Daisuke Taguchi, Kazunori Ono, Takahiro Hiromatsu, Taku Hirayama

Proceedings Volume 13216, 1321628 (2024) https://doi.org/10.1117/12.3037191

KEYWORDS: Extreme ultraviolet, Lithography, Stochastic processes, Line width roughness, Electron beam lithography, Polymers, Photoresist materials, Electron beams, Chemically amplified resists

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Proceedings Article | 29 August 2019 Paper

Continuous challenges for next era of lithography

Takahiro Hiromatsu, Ryo Ohkubo, Hitoshi Maeda, Toru Fukui, Hiroaki Shishido, Kazunori Ono, Masahiro Hashimoto

Proceedings Volume 11177, 1117705 (2019) https://doi.org/10.1117/12.2534910

KEYWORDS: Extreme ultraviolet, Nanoimprint lithography, Binary data, Semiconducting wafers

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Proceedings Article | 27 March 2014 Paper

SRAF window improvement with under-coating layer

Takahiro Hiromatsu, Toru Fukui, Kenta Tsukagoshi, Kazunori Ono, Masahiro Hashimoto

Proceedings Volume 9051, 905120 (2014) https://doi.org/10.1117/12.2046779

KEYWORDS: SRAF, Chromium, Photomasks, Etching, Photoresist processing, Optical lithography, Coating, Absorption, Liquids, Line edge roughness

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Proceedings Article | 27 March 2014 Paper

Reduction of image placement error on photomask-making for multiple patterning

Takahiro Hiromatsu, Toru Fukui, Kenta Tsukagoshi, Kazunori Ono, Masahiro Hashimoto

Proceedings Volume 9051, 90510U (2014) https://doi.org/10.1117/12.2046777

KEYWORDS: Diffusion, Electron beam lithography, Coating, Electron beams, Photomasks, Photoresist processing, Chemically amplified resists, Radon, Lithography, Ions

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