Dr. Takehiko Naruoka
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 27 March 2018 Presentation + Paper
Proceedings Volume 10583, 105831M (2018) https://doi.org/10.1117/12.2297370
KEYWORDS: Ultraviolet radiation, Extreme ultraviolet lithography, Extreme ultraviolet, Absorbance, Optical lithography, Absorption, Line edge roughness, Picosecond phenomena, Chemically amplified resists, Image processing

Proceedings Article | 27 March 2018 Presentation + Paper
Seiji Nagahara, Michael Carcasi, Gosuke Shiraishi, Yuya Kamei, Kathleen Nafus, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Takahiro Shiozawa, Keisuke Yoshida, Masashi Enomoto, Kosuke Yoshihara, Hideo Nakashima, Serge Biesemans, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Teruhiko Moriya, Hayakawa Makoto, Ryo Aizawa, Yoshitaka Konishi, Masafumi Hori, Ken Maruyama, Hisashi Nakagawa, Masayuki Miyake, Tomoki Nagai, Satoshi Dei, Takehiko Naruoka, Motoyuki Shima, Toru Kimura, Geert Vandenberghe, John Petersen, Danilo De Simone, Foubert Philippe, Hans-Jürgen Stock, Balint Meliorisz, Akihiro Oshima, Seiichi Tagawa
Proceedings Volume 10586, 1058606 (2018) https://doi.org/10.1117/12.2297498
KEYWORDS: Ultraviolet radiation, Floods, Picosecond phenomena, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet, Chemically amplified resists, Polymers, Image enhancement, Absorption

Proceedings Article | 5 May 2017 Presentation
Tsuyoshi Furukawa, Takehiko Naruoka, Hisashi Nakagawa, Hiromu Miyata, Motohiro Shiratani, Masafumi Hori, Satoshi Dei, Ramakrishnan Ayothi, Yoshi Hishiro, Tomoki Nagai
Proceedings Volume 10143, 101430X (2017) https://doi.org/10.1117/12.2258164
KEYWORDS: Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line width roughness, High volume manufacturing, Photoresist processing, Lithography, Semiconductor manufacturing, Semiconductors, Line edge roughness

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10146, 101460G (2017) https://doi.org/10.1117/12.2258217
KEYWORDS: Extreme ultraviolet lithography, Chemically amplified resists, Floods, Lithography, Extreme ultraviolet, Line edge roughness, Image processing, Image enhancement, Ultraviolet radiation, Scanners, Picosecond phenomena, Polymers, Line width roughness, Stochastic processes

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10143, 1014329 (2017) https://doi.org/10.1117/12.2258166
KEYWORDS: Chemistry, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Lithography, Chemically amplified resists, Industrial chemicals, Floods, Light sources, Polymers, Picosecond phenomena, Ultraviolet radiation, Chemical reactions, Absorption

Showing 5 of 15 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top