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The 3D multi-physics fully integrated HEIGHTS package was used in this analysis. We continue to develop, enhance, and benchmark the models implemented in our package to include various physics involved in LPP systems. HEIGHTS simulation of detail ion kinetic energies were compared with experimental data and showed great confidence in our advanced self-integrated models that can then be used for the explanation of the experimental data as well as for various predictions. Spatial and charge distributions were predicted for EUV producing ions and debris. We studied various target configurations and laser parameters to enhance the power of EUV sources as well as to reduce and mitigate ions and debris effects on the collecting mirror system. The comprehensive integrated full 3D models allowed accurate simulation of all processes of plasma formation, dynamics, and EUV photons emission and collection.
We expanded and enhanced our models implemented in the HEIGHTS package to simulate LPPs in mixture environment of vapor/plasma created from Sn droplet and the background buffer gas (e.g., Ar) at various pressures. Our integrated models allowed self-consistent simulation of EUV produced and EUV induced plasma evolution in the entire chamber.
We studied tin plasma evolution in single and dual pulse systems in conditions of Ar residual background gas at 3 and 30 Pa pressure. Details of Ar plasma induced by EUV photons were analyzed to predict conditions near mirror surfaces that could change performance of the surface layers and reflectivity of the collecting optical system. Processes of mixture and two plasmas expansion and cooling from both the pre- and the main pulse were simulated for the first time to predict chamber conditions at the next iteration of target/lasers coupling and interaction.
One of the potential problems of EUV sources for high volume manufacture (HVM) regimes can be related to the contamination of chamber environment by products of preceding laser pulse/droplet interactions. Implementation of high, 100 kHz and higher, repetition rate of devices for Sn droplets and laser pulses generation can cause high accumulation of tin in the chamber in the form of vapor/clusters.
Possible tin accumulation in the chamber in dependence on laser parameters and mitigation system efficiency was evaluated. Then, the effects of various pressures of tin vapor on the CO2 and Nd:YAG laser beams propagation and on the size, the intensity, and the efficiency of EUV sources produced were studied.
We continued to enhance our state-of-the art HEIGHTS package to analyze and optimize LPP sources and to make projections and realistic predictions of near future powerful devices. HEIGHTS package includes full 3-D detail description of all integrated physical processes involved in LPP devices. The models continued to be upgraded and well benchmarked in each interaction physics phase of plasma evolution for EUV and BEUV production.
We simulated LPP sources using small droplets as the targets and evaluated the requirements for optimization of these sources in dependence on laser wavelength. We also simulated the targets as distributed fragments resulting from the intense pre-pulse laser energy deposition. Additionally, we simulated vapor/plasma mixture created by pre-pulse laser with comparatively low intensity. We studied mass dependence, laser parameters efficiency, optimization of EUV (13.5 nm) and BEUV (6.7 nm) radiation output, and atomic and ionic debris generation to predict potential damage to the optical collection system from energetic debris and the requirements for mitigating systems to reduce debris fluence. Our modeling and simulation included all phases of laser target evolution: from laser/droplet interaction, energy deposition, target vaporization and fragmentation, ionization, plasma hydrodynamic expansion, thermal and radiation energy redistribution, and EUV/BEUV photons collection as well as detail mapping of photons source location and size. Modeling results were benchmarked against recent experimental studies for the in-band photons production and for debris and ions generation for both EUV and BEUV systems.
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