Mr. Tetsuya Kitagawa Profile

Tetsuya Kitagawa

at Sony Corp

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 6 May 2005 Paper

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

K. Nakayama, T. Kitagawa, H. Nakano, S. Nohdo, T. Takeda, T. Morikawa, H. Egawa, H. Kawahira, S. Moriya, T. Motohashi, K. Oguni, S. Omori, M. Yoshizawa, K. Iwase, S. Nohama

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733

KEYWORDS: Lithography, Etching, Copper, Resistance, Inspection, Photomasks, Photoresist processing, Semiconducting wafers, Charged-particle lithography, Back end of line

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Proceedings Article | 20 August 2004 Paper

Feedforward correction of mask image placement for proximity electron lithography

Shinichiro Nohdo, Tomonori Motohashi, Kenta Yotsui, Takashi Susa, Shinji Omori, Kojiro Itoh, Tetsuya Kitagawa, Akira Tamura

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557821

KEYWORDS: Lithography, Electron beams, Metrology, Scanners, Distortion, Data processing, Photomasks, Semiconducting wafers, Data corrections, Overlay metrology

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Proceedings Article | 20 August 2004 Paper

A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging

Kenta Yotsui, Shoji Nohama, Tetsuya Kitagawa, Akira Tamura, Kazuya Iwase, Gaku Suzuki, Kojiro Itoh, Shigeru Moriya, Satoru Maruyama, Shinji Omori, Yushin Sasaki

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557822

KEYWORDS: Lithography, Electron beam lithography, Defect detection, Opacity, Etching, Inspection, Monte Carlo methods, Photomasks, Photoresist processing, Semiconducting wafers

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SPIE Journal Paper | 1 July 2004

Progress in proximity electron lithography: demonstration of print and overlay performance using the low-energy electron beam proximity-projection lithography β-tool

Shinji Omori, Shinichiro Nohdo, Shoji Nohama, Kouichi Nakayama, Kazuya Iwase, Tomonori Motohashi, Keiko Amai, Yoko Watanabe, Kazuharu Inoue, Isao Ashida, Hidetoshi Ohnuma, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa

JM3, Vol. 3, Issue 03, (July 2004) https://doi.org/10.1117/12.10.1117/1.1759326

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Charged-particle lithography, Optical alignment, Metrology, Distortion, Critical dimension metrology, Electron beam lithography

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Proceedings Article | 20 May 2004 Paper

Analysis of critical dimension uniformity for LEEPL

Kumiko Oguni, Hiroyuki Nakano, Hiizu Ohtorii, Kazuya Iwase, Shigeru Moriya, Tetsuya Kitagawa, Hiroki Hane, Keiko Amai, Masaki Yoshizawa

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536029

KEYWORDS: Lithography, Scattering, Electrons, Scanning electron microscopy, Photomasks, Image enhancement, Critical dimension metrology, Semiconducting wafers, Charged-particle lithography, Edge roughness

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Proceedings Article | 20 May 2004 Paper

First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Shoji Nohama, Hiroyuki Nakano, Shinji Omori, Shigeru Moriya, Masaki Yoshizawa, Hiroichi Kawahira, Tetsuya Kitagawa, Kazuya Iwase

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534423

KEYWORDS: Lithography, Contamination, Image processing, Scanners, Resistance, Photomasks, Photoresist processing, Semiconducting wafers, Charged-particle lithography, Overlay metrology

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Proceedings Article | 17 December 2003 Paper

Litho-and-mask concurrent approach to the critical issues for proximity electron lithography

Shoji Nohama, Shinichiro Nohdo, Shigeru Moriya, Akira Tamura, Kenta Yotsui, Shinji Omori, Kazuya Iwase, Keiko Amai, Tetsuya Kitagawa, Yoko Watanabe, Gaku Suzuki

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518816

KEYWORDS: Lithography, Etching, Image processing, Scanners, Electroluminescence, Photomasks, Photoresist processing, Semiconducting wafers, Charged-particle lithography, Overlay metrology

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Proceedings Article | 28 August 2003 Paper

State-of-the-art performance of stencil mask for LEEPL

Shinji Omori, Shoji Nohama, Yoko Watanabe, Kazuya Iwase, Shigeru Moriya, Keiko Amai, Tetuya Kitagawa, Takayuki Sasaki

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504273

KEYWORDS: Lithography, Etching, Scanning electron microscopy, Photomasks, Image enhancement, Line edge roughness, Photoresist processing, Semiconducting wafers, Charged-particle lithography, Defect inspection

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Proceedings Article | 28 August 2003 Paper

Alignment accuracy of LEEPL: image placement error correction

Shinichiro Nohdo, Hiroyuki Nakano, Shigeru Moriya, Tetsuya Kitagawa, Shinji Omori, Tomonori Motohashi, Nobuo Shimazu

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504067

KEYWORDS: Lithography, Distortion, Photomasks, Cadmium sulfide, Optical alignment, Silicon carbide, Semiconducting wafers, Charged-particle lithography, Overlay metrology, Resolution enhancement technologies

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Proceedings Article | 28 August 2003 Paper

On-site use of 1x stencil mask: control over image placement and dimension

Shinji Omori, Tetuya Kitagawa, Shoji Nohama, Kazuya Iwase, Keiko Amai, Isao Ashida, Takayuki Sasaki, Yoko Watanabe, Shigeru Moriya

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504258

KEYWORDS: Lithography, Metrology, Contamination, Silicon, Distortion, Photomasks, Critical dimension metrology, Semiconducting wafers, Charged-particle lithography, Overlay metrology

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Proceedings Article | 16 June 2003 Paper

Imaging capability of low-energy electron-beam proximity-projection lithography toward the 65/45-nm node

Hiroyuki Nakano, Masaki Yoshizawa, Shigeru Moriya, Shinichiro Nohdo, Tomonori Motohashi, Tetsuya Kitagawa, Kumiko Oguni

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484429

KEYWORDS: Oxides, Lithography, Electron beam lithography, Electron beams, Silicon, Image resolution, Photomasks, Photoresist processing, Charged-particle lithography, Chemically amplified resists

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Proceedings Article | 1 August 2002 Paper

Assessment of mask quality assurance method of critical layers with high MEEF

Tetuya Kitagawa, Akihiro Ogura, Yasuhiro Mizuma, Michihide Tanaka, Hiroyuki Ishida

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476980

KEYWORDS: Semiconductors, Lithography, Defect detection, Inspection, Scanning electron microscopy, Photomasks, Cadmium sulfide, Molybdenum, Semiconducting wafers, Process engineering

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Proceedings Article | 14 September 2001 Paper

Br lamp for F2 laser wavelength calibration

Tomoyoshi Arimoto, Tetsuya Kitagawa, Masaki Yoshioka, Toru Suzuki, Kazuaki Hotta, Tatsumi Hiramoto, Hiromitsu Matsuno

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435659

KEYWORDS: Doppler effect, Calibration, Argon, Chemical species, Electrodes, Glasses, Lamps, Excimers, Vacuum ultraviolet, Bromine

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Proceedings Article | 1 September 1998 Paper

Mask CD quality assurance specifications for 0.25-um devices with a practical lithography window

Kunihiko Tsuboi, Tetuya Kitagawa, Takehiko Gunji

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328825

KEYWORDS: Wafer-level optics, Lithography, Particles, Inspection, Ion beams, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

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Showing 5 of 14 publications

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