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Tomohito Hirose
Photomask at Toppan Printing Co Ltd
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Publications (1)
Proceedings Article | 25 September 2010 Paper
Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask
Yoshifumi Sakamoto, Tomohito Hirose, Hitomi Tsukuda, Taichi Yamazaki, Yosuke Kojima, Hayato Ida, Takashi Haraguchi, Tsuyoshi Tanaka, Ryuji Koitabashi, Yukio Inazuki, Hiroki Yoshikawa
Proceedings Volume 7823, 782324 (2010) https://doi.org/10.1117/12.867710
KEYWORDS: Photomasks, Opacity, Lithography, Radiation effects, Silica, Transmission electron microscopy, Excimer lasers, 193nm lithography, Silicon, Oxidation
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