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Dr. Toru Mikami
at Toshiba Corp
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Publications (4)
Proceedings Article | 24 March 2009 Paper
SCATT: software to model scatterometry using the rigorous electromagnetic theory
S. Babin, L. Doskolovich, Y. Ishibashi, A. Ivanchikov, N. Kazanskiy, I. Kadomin, T. Mikami, Y. Yamazaki
Proceedings Volume 7272, 72723X (2009) https://doi.org/10.1117/12.816904
KEYWORDS: Scatterometry, Systems modeling, Software development, Diffraction, Diffraction gratings, Silicon, 3D modeling, Transistors, Metals, Electromagnetic theory
Proceedings Article | 10 May 2005 Paper
Sampling plan optimization for CD control in low k1 lithography
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600370
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Error analysis, Lithography, Neptunium, Metrology, Statistical analysis, Manufacturing, Reticles, Process control
Proceedings Article | 10 May 2005 Paper
Usage of profile information obtained with scatterometry
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600325
KEYWORDS: Scatterometry, Photoresist materials, Critical dimension metrology, Metrology, Silicon, Atomic force microscopy, Data modeling, Process control, Scatter measurement, Semiconducting wafers
Proceedings Article | 10 May 2005 Paper
Novel inspection technology for half pitch 55 nm and below
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599178
KEYWORDS: Semiconducting wafers, Inspection, Reflectivity, Birefringence, Polarization, Image processing, Wafer testing, Dielectric polarization, Dielectrics
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