Mr. Toshio Suzuki Profile

Toshio Suzuki

at Dai Nippon Printing Co Ltd

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 11 May 2009 Paper

Evaluation of mask data format standard OASIS.MASK developed for mask tools

Toshio Suzuki, Yoshinori Nagaoka, Yumiko Maenaka, Venu Vellanki, Wayne Ruch, Masayoshi Mori, Keiko Hattori, Kunihiro Hosono, Shogo Narukawa, Morihisa Hoga, Hiroshi Mohri

Proceedings Volume 7379, 737931 (2009) https://doi.org/10.1117/12.824351

KEYWORDS: Data conversion, Inspection, Photomasks, Data storage servers, Standards development, Vestigial sideband modulation, Data storage, Metals, Metrology, Printing

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Proceedings Article | 20 May 2006 Paper

Advanced mask rule check (MRC) tool

Kokoro Kato, Kuninori Nishizawa, Tadao Inoue, Koki Kuriyama, Toshio Suzuki, Shogo Narukawa, Naoya Hayashi

Proceedings Volume 6283, 62830O (2006) https://doi.org/10.1117/12.681848

KEYWORDS: Photomasks, Data conversion, Manufacturing, Electronic design automation, Inspection, Nanotechnology, Data processing, Optical proximity correction, Resolution enhancement technologies, Printing

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Proceedings Article | 20 May 2006 Paper

Evaluation of OASIS.VSB (SEMI P44) for practical use

Koki Kuriyama, Toshio Suzuki, Shogo Narukawa, Hiroshi Mohri, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 6283, 62832O (2006) https://doi.org/10.1117/12.681801

KEYWORDS: Photomasks, Vestigial sideband modulation, Data conversion, Manufacturing, Data modeling, Standards development, Data storage, Inspection, Raster graphics, Computing systems

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Proceedings Article | 9 November 2005 Paper

Application of the unified mask data format based on OASIS for VSB EB writers

Toshio Suzuki, Junji Hirumi, Osamu Suga

Proceedings Volume 5992, 59924F (2005) https://doi.org/10.1117/12.638800

KEYWORDS: Vestigial sideband modulation, Data conversion, Photomasks, Resolution enhancement technologies, Electronic design automation, Inspection, Manufacturing, Standards development, Optical proximity correction, Printing

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Proceedings Article | 28 June 2005 Paper

The unified mask data format based on OASIS for VSB EB writers

Toshio Suzuki, Junji Hirumi, Yutaka Hojyo, Yuichi Kawase, Shinji Sakamoto, Koki Kuriyama, Syogo Narukawa, Morihisa Hoga

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617423

KEYWORDS: Data conversion, Vestigial sideband modulation, Photomasks, Optical proximity correction, Electronic design automation, Resolution enhancement technologies, Printing, Standards development, Inspection, Semiconductors

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Proceedings Article | 16 June 2005 Paper

Extending OASIS for the unification of mask data representation

Emile Sahouria, Steffen Schulze, Toshio Suzuki, Junji Hirumi

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637283

KEYWORDS: Photomasks, Manufacturing, Data conversion, Resolution enhancement technologies, Vestigial sideband modulation, Standards development, Mask making, Inspection equipment, Inspection, Integrated circuits

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Proceedings Article | 6 December 2004 Paper

Enhancement of unified mask data formats for EB writers

Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojyo, Yuichi Kawase, Shinji Sakamoto, Koki Kuriyama, Syogo Narukawa, Morihisa Houga

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.579130

KEYWORDS: Vestigial sideband modulation, Data conversion, Photomasks, Cobalt, Data compression, Printing, Standards development, Semiconductors, Manufacturing, Photomask technology

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Proceedings Article | 20 August 2004 Paper

Improvement of unified mask data formats for EB writers

Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojyo, Yuichi Kawase, Shigehiro Hara, Koki Kuriyama, Morihisa Hoga, Satoshi Watanabe, Hidemichi Kawase, Tomoko Kamimoto, Kokoro Kato

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557738

KEYWORDS: Data conversion, Photomasks, Vestigial sideband modulation, Manufacturing, Data compression, Printing, Prototyping, Resolution enhancement technologies, Semiconductors, Nanotechnology

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Proceedings Article | 17 December 2003 Paper

Investigation of an enhanced mask data preparation system using unified mask data formats

Toshio Suzuki, Koki Kuriyama, Junji Hirumi, Nobuyuki Yoshioka, Hidemichi Kawase, Tomoko Kamimoto

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518436

KEYWORDS: Data conversion, Manufacturing, Vestigial sideband modulation, Photomasks, Data processing, Resolution enhancement technologies, Parallel processing, Prototyping, Semiconductors, Neodymium

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Proceedings Article | 28 August 2003 Paper

Unified mask data formats for EB writers

Koki Kuriyama, Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojo, Yuichi Kawase, Shigehiro Hara, Morihisa Hoga, Satoshi Watanabe, Masa Inoue, Hidemuchi Kawase, Tomoko Kamimoto

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504218

KEYWORDS: Photomasks, Manufacturing, Vestigial sideband modulation, Data modeling, Data conversion, Data processing, Semiconductors, Instrument modeling, Resolution enhancement technologies, Optical proximity correction

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Showing 5 of 10 publications

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