Mr. Warren D. Holcomb Profile

Warren D. Holcomb

at Lawrence Berkeley National Lab

SPIE Involvement:

Author

Publications (4)

SPIE Journal Paper | 18 October 2024 Open Access

Characterization of latent image of electron beam resist via critical-dimension resonant soft X-ray scattering

Qi Zhang, Kas Andrle, Weilun Chao, Zhengxing Peng, Warren Holcomb, Ryan Miyakawa, Dinesh Kumar, Alexander Hexemer, Patrick Naulleau, Bruno La Fontaine, Ricardo Ruiz, Cheng Wang

JM3, Vol. 23, Issue 04, 044003, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.044003

KEYWORDS: Scattering, X-rays, X-ray imaging, Stochastic processes, Atomic force microscopy, Extreme ultraviolet lithography, Electron beams, Simulations, Laser scattering, Finite element methods

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Proceedings Article | 10 April 2024 Presentation

Characterization of chemical/structural information of latent image via critical-dimension resonant soft x-ray scattering

Qi Zhang, Weilun Chao, Warren Holcomb, Ryan Miyakawa, Dinesh Kumar, Ricardo Ruiz, Andrew Neureuther, Patrick Naulleau, Cheng Wang

Proceedings Volume 12955, 129550A (2024) https://doi.org/10.1117/12.3010967

KEYWORDS: Scattering, X-rays, X-ray imaging, X-ray characterization, Photoresist materials, X-ray sources, Data modeling, Light scattering, Laser scattering, Extreme ultraviolet lithography

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Proceedings Article | 22 November 2023 Presentation

Nanoscale chemical metrology on latent EUV resist images

Padraic O'Reilly, Luke Long, Warren Holcomb, Thomas Albrecht, Brian Grennon, Patrick Naulleau, Sung Park

Proceedings Volume PC12750, PC127500H (2023) https://doi.org/10.1117/12.2686908

KEYWORDS: Extreme ultraviolet, Metrology, Stochastic processes, Photoresist processing, Line width roughness, Line edge roughness, Infrared spectroscopy, Infrared imaging, Infrared microscopy, Extreme ultraviolet lithography

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Proceedings Article | 22 November 2023 Poster

Metrology development on latent images via critical-dimension resonant soft x-ray scattering

Qi Zhang, Weilun Chao, Warren Holcomb, Ryan Miyakawa, Ricardo Ruiz, Dinesh Kumar, Andrew Neureuther, Patrick Naulleau, Cheng Wang

Proceedings Volume PC12750, PC1275012 (2023) https://doi.org/10.1117/12.2689943

KEYWORDS: Scattering, X-rays, X-ray imaging, Metrology, Systems modeling, X-ray sources, X-ray characterization, Time metrology, Spatial resolution, Simulations

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