Dr. Wenjin Shao Profile

Dr. Wenjin Shao

at ASML

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 2 April 2011 Paper

Model-based scanner tuning for process optimization

Rafael Aldana, Venu Vellanki, Wenjin Shao, Ronald Goossens, Zongchang Yu, Xu Xie, Yu Cao, Koen Schreel, Peter Lee, Won Kim, Tjitte Nooitgedagt

Proceedings Volume 7985, 79850L (2011) https://doi.org/10.1117/12.882764

KEYWORDS: Scanners, Semiconducting wafers, Calibration, Critical dimension metrology, Metrology, Optimization (mathematics), Printing, Data modeling, Photomasks, Model-based design

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Proceedings Article | 23 March 2011 Paper

Optimizing OPC data sampling based on "orthogonal vector space"

Yuyang Sun, Yee Mei Foong, Yingfang Wang, Jacky Cheng, Dongqing Zhang, Shaowen Gao, Nanshu Chen, Byoung Il Choi, Antoine Bruguier, Mu Feng, Jianhong Qiu, Stefan Hunsche, Liang Liu, Wenjin Shao

Proceedings Volume 7973, 79732K (2011) https://doi.org/10.1117/12.881575

KEYWORDS: Data modeling, Vector spaces, Calibration, Optical proximity correction, Semiconducting wafers, Statistical modeling, Metrology, Time metrology, Process modeling, Image analysis

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Proceedings Article | 23 March 2011 Paper

Advanced scanner matching using freeform source and lens manipulators

Jong-Ho Lim, Kyung Kang, Sung-Man Kim, Wenjin Shao, Fei Du, Zhengfan Zhang, Zongchang Yu, John Barbuto, Venu Vellanki, Yu Cao, Ronald Goossens, Seung-Hoon Park, Chris Park, Stefan Hunsche, Junwei Lu

Proceedings Volume 7973, 79732A (2011) https://doi.org/10.1117/12.881680

KEYWORDS: Scanners, Semiconducting wafers, Birefringence, Critical dimension metrology, Diffractive optical elements, Metrology, Cadmium, Fiber optic illuminators, Data modeling, Computational lithography

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Proceedings Article | 23 March 2011 Paper

Improved fab CDU with FlexRay and LithoTuner

Robert Socha, Wenjin Shao, Xu Xie, Youri van Dommelen, Dorothe Oorschot, Henry Megens, Venu Vellanki

Proceedings Volume 7973, 79730Q (2011) https://doi.org/10.1117/12.879619

KEYWORDS: Scanners, Critical dimension metrology, Semiconducting wafers, Data modeling, Diffractive optical elements, Calibration, Optical proximity correction, Micromirrors, Metrology, Lithography

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Proceedings Article | 23 March 2011 Paper

Scanner matching for standard and freeform illumination shapes using FlexRay

J. Bekaert, L. Van Look, K. D'havé, B. Laenens, G. Vandenberghe, P. van Adrichem, W. Shao, J. Ghan, K. Schreel, J. T. Neumann

Proceedings Volume 7973, 79731I (2011) https://doi.org/10.1117/12.881607

KEYWORDS: Scanners, Fiber optic illuminators, Semiconducting wafers, Photomasks, Reticles, Diffractive optical elements, Cadmium, Critical dimension metrology, Manufacturing, Optical lithography

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Proceedings Article | 4 March 2010 Paper

Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Yuan He, Erik Byers, Scott Light, Danielle Hines, Anton Devilliers, Mike Hyatt, Jianming Zhou, Vinay Nair, Zongchang Yu, Yu Cao, Xu Xie, Wenjin Shao, Rafael Aldana, Ronald Goossens, Chang-Qun Ma, Junwei Lu, Hua-yu Liu, Chris Aquino, Peter Engblom, Tjitte Nooitgedagt, Eric Janda

Proceedings Volume 7640, 764014 (2010) https://doi.org/10.1117/12.848255

KEYWORDS: Scanners, Wafer-level optics, Semiconducting wafers, Metrology, Data modeling, Calibration, Critical dimension metrology, Optics manufacturing, Performance modeling, Optical simulations

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Proceedings Article | 12 December 2009 Paper

Model-based scanner tuning for process optimization

Tsung-Chih Chien, C. Y. Shih, R. C. Peng, H. H. Liu, Y. C. Chen, H. J. Lee, John Lin, K. W. Chang, C. M. Wu, W. H. Hung, Tommy Lee, H. C. Wu, X. Xie, W. J. Shao, C. H. Chang, R. Aldana, Y. Cao, R. Goossens, Simon Hsieh

Proceedings Volume 7520, 75201Q (2009) https://doi.org/10.1117/12.842551

KEYWORDS: Scanners, Semiconducting wafers, Calibration, Lithography, Yield improvement, Model-based design, Data modeling, Wafer-level optics, Optimization (mathematics), Process modeling

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Proceedings Article | 16 March 2009 Paper

Model-based scanner tuning in a manufacturing environment

C. Y. Shih, R. C. Peng, T. C. Chien, Y. W. Guo, J. Y. Lee, C. L. Chang, P. C. Huang, H. H. Liu, H. J. Lee, John Lin, K. W. Chang, C. P. Yeh, W. J. Shao, H. Cao, A. Bruguier, X. Xie, C. H. Chang, R. Aldana, Y. Cao, R. Goossens, Simon Hsieh

Proceedings Volume 7274, 72740T (2009) https://doi.org/10.1117/12.813974

KEYWORDS: Scanners, Semiconducting wafers, Data modeling, Calibration, Lithography, Manufacturing, Model-based design, Optical proximity correction, Wafer-level optics, Reticles

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Proceedings Article | 19 May 2008 Paper

Separable OPC models for computational lithography

Hua-Yu Liu, Qian Zhao, J. Fung Chen, Jiong Jiang, Robert Socha, Eelco Van Setten, Andre Engelen, Jeroen Meessen, Michael Crouse, Mu Feng, Wenjin Shao, Hua Cao, Yu Cao, Lieve Van Look, Joost Bekaert, Geert Vandenberghe, Jo Finders

Proceedings Volume 7028, 70280X (2008) https://doi.org/10.1117/12.793039

KEYWORDS: 3D modeling, Optical proximity correction, Calibration, Photomasks, Data modeling, Semiconducting wafers, Performance modeling, Finite element methods, Lithography, Wafer-level optics

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Proceedings Article | 15 March 2006 Paper

Predictive focus exposure modeling (FEM) for full-chip lithography

Luoqi Chen, Yu Cao, Hua-yu Liu, Wenjin Shao, Mu Feng, Jun Ye

Proceedings Volume 6154, 61541T (2006) https://doi.org/10.1117/12.656891

KEYWORDS: Finite element methods, Data modeling, Calibration, Lithography, Optical proximity correction, Semiconducting wafers, Photomasks, Resolution enhancement technologies, Photoresist processing, Optical imaging

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Showing 5 of 10 publications

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