Dr. Xiaolei Liu Profile

Dr. Xiaolei Liu

at KLA China

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 27 April 2023 Presentation + Paper

OPO improvements by Moiré effect-based imaging

Yonglei Li, Justin Lim, Nahee Park, Yuqian Zhang, Xiaolei Liu, Yasutaka Okada, Gloria Chen, Ben McClain, Erin Hollinger, Amy Weatherly, Yoav Grauer, Zephyr Liu, Raviv Yohanan, Greg Gray, Mark Stakely, Shlomit Katz, Mahendra Dubey, Neeraj Khanna

Proceedings Volume 12496, 124960R (2023) https://doi.org/10.1117/12.2658074

KEYWORDS: Design and modelling, Metrology, Overlay metrology, Process control, Inspection, Optical lithography, Imaging metrology, Semiconductors, Moire patterns

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Proceedings Article | 26 May 2022 Poster + Paper

Process optimization by virtual target design in overlay metrology

Xiaolei Liu, Yoav Grauer, Raviv Yohanan, Mark Ghinovker, Diana Shaphirov, Iwata Yasuhisa, Imura Koichi, Ito Kosuke, Xindong Gao

Proceedings Volume 12053, 1205322 (2022) https://doi.org/10.1117/12.2614129

KEYWORDS: Metrology, Overlay metrology, Semiconducting wafers, Tolerancing, Device simulation, Calibration, Photomasks, Virtual reality, Opacity, Roads

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Proceedings Article | 22 February 2021 Presentation + Paper

Moiré effect-based overlay target design for OPO improvements

Dieter Van den Heuvel, Philippe Leray, Eitan Hajaj, Diana Shaphirov, Eltsafon Ashwal, Chen Dror, Raviv Yohanan, Mark Ghinovker, Katya Gordon, Zephyr Liu, Xiaolei Liu, Roel Gronheid, Hedvi Spielberg

Proceedings Volume 11611, 1161125 (2021) https://doi.org/10.1117/12.2585876

KEYWORDS: Optical parametric oscillators, Visible radiation, Standards development, Overlay metrology, Optical components, Microscopy, Integrated optics, Integrated circuits

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Proceedings Article | 22 February 2021 Presentation

Memory OPO improvement using novel target design

Eitan Hajaj, Honggoo Lee, Chanha Park, Sangho Lee, Dongyoung Lee, Dohwa Lee, Dongsoo Kim, Sanghuck Jeon, Dongsub Choi, Eltsafon Ashwal, Chen Dror, Raviv Yohanan, Zephyr Liu, xiaolei liu, Diana Shaphirov, Katya Gordon, Mark Ghinovker

Proceedings Volume 11611, 1161137 (2021) https://doi.org/10.1117/12.2584524

KEYWORDS: Overlay metrology, Optical parametric oscillators, Standards development, Manufacturing, Integrated circuits

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Proceedings Article | 22 February 2021 Presentation

Advanced overlay target optimization and Integration in optical metrology

Eitan Hajaj, Diana Shaphirov, Eltsafon Ashwal, Chen Dror, Raviv Yohanan, Mark Ghinovker, Katya Gordon, Zephyr Liu, Xiaolei Liu, Isaac Salib

Proceedings Volume 11611, 1161138 (2021) https://doi.org/10.1117/12.2584525

KEYWORDS: Overlay metrology, Optical metrology, Computer simulations, Wafer-level optics, Time metrology, Semiconducting wafers, Optical parametric oscillators, Metrology, Geometrical optics, Calibration

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Accuracy enhancement in imaging-based overlay metrology by optimizing measurement conditions per layer

Shlomit Katz, Yoav Grauer, Raviv Yohanan, Xiaolei Liu, Daria Negri, Anna Golotsvan

Proceedings Volume 11611, 116112O (2021) https://doi.org/10.1117/12.2583615

KEYWORDS: Overlay metrology, Computer simulations

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Proceedings Article | 20 March 2020 Paper

Improved device overlay by litho aberration tracking with novel target design for DRAM

Xiaolei Liu, Eitan Hajaj, Alon Volfman, Hedvi Spielberg, Yoav Grauer, Raviv Yohanan, Xindong Gao

Proceedings Volume 11325, 113252R (2020) https://doi.org/10.1117/12.2551990

KEYWORDS: Overlay metrology, Lithographic illumination, Optical proximity correction, Diffraction gratings

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SPIE Journal Paper | 8 August 2014

Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography

Xiaolei Liu, Xiangzhao Wang, Sikun Li, Guanyong Yan, Andreas Erdmann

JM3, Vol. 13, Issue 03, 033007, (August 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.033007

KEYWORDS: Photomasks, Diffraction, Critical dimension metrology, Extreme ultraviolet lithography, Waveguides, Extreme ultraviolet, Calibration, Mathematical modeling, Reflectivity, Wave propagation

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Proceedings Article | 17 April 2014 Paper

Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography

Xiaolei Liu, Xiangzhao Wang, Sikun Li, Guanyong Yan, Andreas Erdmann

Proceedings Volume 9048, 90483E (2014) https://doi.org/10.1117/12.2046333

KEYWORDS: Photomasks, Diffraction, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Silicon, Mathematical modeling, Lithographic illumination, Laser sintering, Reflectivity

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Showing 5 of 9 publications

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