Using the method of double-sided polishing with oscillating and rotating upper disk, we have investigated the material removal behavior of flat fused silica. It is suggested that the material removal characteristics of the optics depend on the positon and size of the upper polishing disk. Measurements together with the kinematic model results show that the effect of the swing position and size of upper polishing disk similar to sub-aperture polishing, leading to the non-uniformity distribution of the material removal on the surface of the optic component. the surface figure errors of 0.5 wavelengths is achieved after polishing process. The efficiency and quality of double-sided polishing can be improved through changing polishing disk and swing position according to this study.
For applications such as inertial confinement fusion and remote imaging detection, optical components need to meet the requirements of ultra smooth and low loss, and their manufacturing methods must meet the requirements of eliminating surface defects and subsurface damage. This paper mainly studies a polishing method for large-diameter optical components, which combines classical polishing with equal vacuum ionization polishing to balance polishing efficiency and removal of damaged layers. The idea of combined polishing can be extended to the comprehensive application of various polishing methods.
In order to solve the problems of no uniform coating, edge coating, and severe coating defects in the process when processing 430mm×430mm optical components, The basic requirements of surface roughness data acquisition are analyzed and the application of inductive sensor in surface roughness is introduced. Optical element flattening layer coating and flow direction mechanisms, flattening layer material selection, and research on material characteristics and optical element planarization layer deposition process, achieving uniform coating of optical elements, reducing coating defects, and meeting the requirements of the next process polishing
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