Dr. Yao Zhang Profile

Dr. Yao Zhang

at KLA Corp

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 12 November 2024 Presentation + Paper

Comprehensive EUV fab data management solution bridging reticle and wafer inspections

Alice Fu, Howard Lin, Calvin Hung, Bing-Rui Li, Ellis Lu, Jerry Hsieh, Brandon Hurt, Ryan Carlson, Xinya Liu, Masaki Satake, Derui Li, Will Wang, Wallace Wang, Brian Du, Daojing Li, Yao Zhang, Zeyu Lei, Narayani Narasimhan, Daniel Price, Vikram Tolani

Proceedings Volume 13215, 1321509 (2024) https://doi.org/10.1117/12.3033686

KEYWORDS: Reticles, Semiconducting wafers, Defect inspection, Wafer inspection, High volume manufacturing, Extreme ultraviolet, Scanning electron microscopy, Extreme ultraviolet lithography, Printing, Manufacturing

Read Abstract +

Proceedings Article | 10 April 2024 Poster + Paper

Hotspot discovery and variability analysis for advanced EUV processes

Kaushik Sah, Zhijin Chen, Yao Zhang, Liming Zhang, Cao Zhang, Craig Higgins, Anatoly Burov, Guy Parsey, Pradeep Vukkadala, Roel Gronheid, Arpit Jain, Ramakanth Ramini, Ankur Agrawal, Garima Sharma, Andrew Cross, Syamashree Roy, Victor Blanco

Proceedings Volume 12955, 129553H (2024) https://doi.org/10.1117/12.3011178

KEYWORDS: Stochastic processes, Scanning electron microscopy, Design, Semiconducting wafers, Inspection, Metrology, Extreme ultraviolet lithography, Defect inspection

Read Abstract +

Proceedings Article | 1 December 2022 Paper

Comprehensive extreme ultraviolet blank defect avoidance system

Brandon Hurt, Ryan Carlson, Yao Zhang, Xiaochun Yang, Masaki Satake, Yifu Wang, Derui Li, Vikram Tolani, Daniel Price

Proceedings Volume 12292, 122920C (2022) https://doi.org/10.1117/12.2642401

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Reticles, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers, Scanning electron microscopy, Printing, Databases

Read Abstract +

Proceedings Article | 23 October 2020 Presentation + Paper

Need for comprehensive reticle data management and analytics

Daniel Price, Brandon Hurt, Ryan Carlson, Ryan Gardner, Yao Zhang, Masaki Satake, Derui Li, Will Wang, Wallace Wang, Peter Liu, George Hwa, Vikram Tolani

Proceedings Volume 11518, 115180Q (2020) https://doi.org/10.1117/12.2573765

KEYWORDS: Photomasks, Reticles, Analytics, Manufacturing, Inspection, Semiconducting wafers, Process control, Etching, Metrology, Overlay metrology

Read Abstract +

Mask-shops developing advanced reticles for use in high-volume semiconductor manufacturing generate an abundance of critical data. Most of this data is generated in the backend of the mask production line where critical dimensions (CDs), registration and defect inspections are performed, and the general emphasis of this data collection is to confirm that the mask meets certain required specifications. Some of the results gathered are also used to monitor the front-end of line processing steps like mask write, develop, etch and clean. However, with most data being disparate and staying local to the tools where they were gathered, very little gets used beyond the immediate need to disposition the mask for shipment. This extensive data, when effectively stored and analyzed, helps not only accelerate time-to-results for mask disposition but also substantially improve monitoring of the frontend process and root-cause analyses. This paper discusses requirements for an effective data management system (DMS) capable of centralizing all maskshop data. This involves not only centralizing blank and pattern defect inspection results and the associated review SEM, repair, and AIMS^TM disposition data but also CD, registration and other metrology data collected. The DMS architecture needs to support connectivity and use of data from other databases in the maskshop which include production tracking, computational application results, tool and fab environment logs, etc. After centralizing the data and establishing linkage to other databases, the system needs to provide visualizations through user-interfaces and advanced analytics that are easy for use by both production and engineering. The paper introduces the new KlearView^TM mask DMS system from KLA and discusses it’s features and deployment into advanced mask manufacturing. While quintessential to maskshop operations, the DMS also serves as a bridge to reticle requalification and wafer inspection and metrology data critical to improving mask quality and qualification necessary for achieving optimal EUV lithography cost-of-ownership.

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years