Dr. Yiping Yao
at IBM Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11323, 113230P (2020) https://doi.org/10.1117/12.2551612
KEYWORDS: Scanners, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Carbon, Contamination, Calibration, Sensors, Extreme ultraviolet

SPIE Journal Paper | 31 July 2018
JM3, Vol. 18, Issue 01, 011004, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011004
KEYWORDS: Etching, Optical lithography, Extreme ultraviolet, Head-mounted displays, Silicon, Chemistry, Amorphous silicon, Argon, Polymers, Interfaces

Proceedings Article | 19 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830V (2018) https://doi.org/10.1117/12.2296751
KEYWORDS: Etching, Optical lithography, Chemistry, Head-mounted displays, Silicon, Argon, Amorphous silicon, Polymers, Extreme ultraviolet, Interfaces

SPIE Journal Paper | 23 May 2017
Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hoa Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy
JM3, Vol. 16, Issue 02, 023504, (May 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023504
KEYWORDS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography

Proceedings Article | 27 March 2017 Presentation + Paper
Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hao Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy
Proceedings Volume 10146, 1014615 (2017) https://doi.org/10.1117/12.2258380
KEYWORDS: Metals, Titanium, Lithography, Optical lithography, Dry etching, Etching, Photoresist materials, Titanium dioxide, Wet etching, Plasma, Carbon

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