Mr. Yoshio Tanaka Profile

Yoshio Tanaka

Executive Emeritus

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 28 August 2003 Paper

Photomask quality assessment strategy at 90-nm technology node with aerial image simulation

Yoshikazu Nagamura, Kunihiro Hosono, Linyong Pang, Kevin Chan, Yoshio Tanaka

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504209

KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Critical dimension metrology, Virtual reality, Image quality, Resolution enhancement technologies, Inspection, Manufacturing, Scanning electron microscopy

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Proceedings Article | 3 July 1995 Paper

Evaluation of shifter edge shape on attenuated phase-shifting mask

Taro Saito, Hideyuki Jinbo, K. Yano, Seki Suzuki, Yoshio Tanaka

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212802

KEYWORDS: Edge roughness, Photomasks, Wet etching, Semiconducting wafers, Phase shifts, Manufacturing, Computer simulations, Electron beams, Image processing, Dry etching

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Proceedings Article | 3 November 1994 Paper

Application of conventional defect repair technique to phase-shifting masks

Katsuhiro Takushima, Hideyuki Jinbo, Taro Saito, Itsuji Ashida, Yoshio Tanaka

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191950

KEYWORDS: Phase shifts, Quartz, Laser energy, Information operations, Gallium, Photomasks, Nd:YAG lasers, Etching, X-ray technology, Ions

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Proceedings Article | 15 February 1994 Paper

Continous phase transitions fabricated by subtractive process

Taro Saito, Hideyuki Jinbo, Katsuhiro Takushima, Itsuji Ashida, Yoshio Tanaka

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167281

KEYWORDS: Photomasks, Quartz, Phase shifting, Phase shifts, Etching, Photomicroscopy, Reticles, Scanning electron microscopy, Photoresist processing, Semiconducting wafers

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Proceedings Volume Editor (1)

SPIE Conference Volume | 10 May 2007

Photomask and Next-Generation Lithography Mask Technology XIV

Conference Committee Involvement (5)

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Photomask and Next Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

Photomask and NGL Mask Technology X

16 April 2003 | Yokohama, Japan

Symposium on Photomask and X-Ray Mask Technology

18 April 1996 | Kawasaki City, Japan

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