Mr. Yoshiyuki Negishi Profile

Yoshiyuki Negishi

at Toppan Printing Co Ltd

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Author

Publications (12)

Proceedings Article | 1 October 2013 Paper

Two-dimensional mask effects at the 14 nm logic node

A. Zweber, A. McGuire, M. Hibbs, S. Nash, K. Ballman, T. Faure, J. Rankin, T. Isogawa, T. Senna, Y. Negishi, M. Miller, S. Barai, D. Dechene

Proceedings Volume 8880, 88800P (2013) https://doi.org/10.1117/12.2028909

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Data modeling, Logic, Chromium, Lithography, SRAF, Metrology, Immersion lithography

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Proceedings Article | 28 June 2013 Paper

Using pattern shift to avoid blank defects during EUVL mask fabrication

Yoshiyuki Negishi, Yuki Fujita, Kazunori Seki, Toshio Konishi, Jed Rankin, Steven Nash, Emily Gallagher, Alfred Wagner, Peter Thwaite, Ahmad Elayat

Proceedings Volume 8701, 870112 (2013) https://doi.org/10.1117/12.2030765

KEYWORDS: Extreme ultraviolet lithography, Inspection, Metals, Extreme ultraviolet, Photomasks, Lithography, Tantalum, Mask making, Visualization, Computer simulations

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Proceedings Article | 8 November 2012 Paper

Study and comparison of negative tone resists for fabrication of bright field masks for 14nm node

Amy Zweber, Tom Faure, Anne McGuire, Linda Sundberg, Ratnam Sooriyakumaran, Martha Sanchez, Luisa Bozano, Tasuku Senna, Yuki Fujita, Yoshiyuki Negishi, Masahito Tanabe, Takahiro Kaneko

Proceedings Volume 8522, 85220S (2012) https://doi.org/10.1117/12.976878

KEYWORDS: Photomasks, Line edge roughness, SRAF, Manufacturing, Opacity, Critical dimension metrology, Phase shifts, Binary data, Photoresist processing, Electron beam lithography

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Proceedings Article | 8 November 2012 Paper

Impact of EUV photomask line-edge roughness on wafer prints

Zhengqing John Qi, Emily Gallagher, Yoshiyuki Negishi, Gregory McIntyre, Amy Zweber, Tasuku Senna, Satoshi Akutagawa, Toshio Konishi

Proceedings Volume 8522, 85222H (2012) https://doi.org/10.1117/12.976855

KEYWORDS: Photomasks, Line edge roughness, Semiconducting wafers, Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Lithographic illumination, Photoresist materials, Linear filtering

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Proceedings Article | 23 March 2012 Paper

EUV mask line edge roughness

Amy Zweber, Emily Gallagher, Martha Sanchez, Tasuku Senna, Yoshiyuki Negishi, Toshio Konishi, Anne McGuire, Luisa Bozano, Phil Brock, Hoa Truong

Proceedings Volume 8322, 83220O (2012) https://doi.org/10.1117/12.916291

KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Edge detection, Image filtering, EUV optics, Pixel resolution, Line width roughness

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Proceedings Article | 30 October 2007 Paper

A study of precision performance and scan damage of EUV masks with the LWM9000 SEM

Isao Yonekura, Hidemitsu Hakii, Takashi Yoshii, Yoshiyuki Negishi, Katsumi Oohira, Koichirou Kanayama, Masashi Kawashita, Yo Sakata, Keishi Tanaka

Proceedings Volume 6730, 67305H (2007) https://doi.org/10.1117/12.746373

KEYWORDS: Extreme ultraviolet, Scanning electron microscopy, Reflectivity, Chromium, Time metrology, Ozone, Precision measurement, Metrology, Image analysis, Electron beams

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Proceedings Article | 20 May 2006 Paper

Dissolution behavior of chemically amplified resist for advanced mask- and NIL mold-making as studied by dissolution rate monitor

Kazumasa Takeshi, Kazuto Oono, Yoshiyuki Negishi, Daisuke Inokuchi, Keishi Tanaka, Akira Tamura

Proceedings Volume 6283, 62831Z (2006) https://doi.org/10.1117/12.681763

KEYWORDS: Nanoimprint lithography, Polymers, Semiconducting wafers, Chemically amplified resists, Lithography, Vestigial sideband modulation, Photoresist processing, Quartz, Crystals, Mask making

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Proceedings Article | 23 March 2006 Paper

Resolution improvement of EPL stencil mask using thin membrane

Hiroshi Sugimura, Hideyuki Eguchi, Masashi Norimoto, Yoshiyuki Negishi, Isao Yonekura, Kojiro Ito, Akira Tamura, Fumihiro Koba, Hiroshi Arimoto

Proceedings Volume 6151, 61511F (2006) https://doi.org/10.1117/12.655425

KEYWORDS: Photomasks, Reactive ion etching, Etching, Semiconducting wafers, Scattering, Mask making, Electron beam lithography, Silicon, Image resolution, Optical lithography

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Proceedings Article | 28 June 2005 Paper

Development of positive-tone chemically amplified resist for LEEPL mask making

Yoshiyuki Negishi, Kazumasa Takeshi, Takashi Yoshii, Keishi Tanaka, Yasuhiro Okumoto

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617283

KEYWORDS: Charged-particle lithography, Mask making, Vestigial sideband modulation, Photomasks, Chemically amplified resists, Diffusion, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Semiconductors

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Proceedings Article | 28 June 2005 Paper

Image placement of large window-size membrane for EPL and LEEPL mask

Hideyuki Eguchi, Tomoya Sumida, Takashi Susa, Yoshiyuki Negishi, Toshiaki Kurosu, Takashi Yoshii, Tsukasa Yamazaki, Kenta Yotsui, Hiroshi Sugimura, Akira Tamura

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617287

KEYWORDS: Photomasks, Charged-particle lithography, Electron beam lithography, Projection lithography, Microelectromechanical systems, Solids

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Proceedings Article | 28 June 2005 Paper

Stencil pattern accuracy of EPL masks

Hiroshi Sugimura, Tsukasa Yamazaki, Takashi Susa, Yoshiyuki Negishi, Takashi Yoshii, Hideyuki Eguchi, Akira Tamura

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617279

KEYWORDS: Photomasks, Reactive ion etching, Critical dimension metrology, Lithography, Mask making, Silicon, Etching, Electron beam lithography, Projection lithography, Distortion

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Proceedings Article | 6 December 2004 Paper

Practical LEEPL masks for sub-65-nm node

Kenta Yotsui, Tomoya Sumida, Yoshiyuki Negishi, Takashi Yoshii, Kojiro Itoh, Akira Tamura

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570353

KEYWORDS: Critical dimension metrology, Photomasks, Charged-particle lithography, Defect inspection, Silicon, Defect detection, Semiconducting wafers, Scanning electron microscopy, Etching, X-rays

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Showing 5 of 12 publications

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