Mr. Yoshiyuki Tanaka Profile

Yoshiyuki Tanaka

Sr. Researcher at Semiconductor Leading Edge Technologies Inc

SPIE Involvement:

Author

Proceedings Article | 23 October 2006 Paper

Advanced photomask repair technology for 65-nm lithography

Fumio Aramaki, Tomokazu Kozakai, Masashi Muramatsu, Yasuhiko Sugiyama, Yoshihiro Koyama, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Toshio Doi, Ryoji Hagiwara, Tatsuya Adachi, Anto Yasaka, Yoshiyuki Tanaka, Osamu Suga, Naoki Nishida, Youichi Usui

Proceedings Volume 6349, 63491E (2006) https://doi.org/10.1117/12.691195

KEYWORDS: Photomasks, Etching, Computer aided design, Lithography, Transmittance, Process control, Opacity, Data processing, Scanning electron microscopy, CAD systems

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Proceedings Article | 20 May 2006 Paper

Advanced photomask repair technology for 65-nm lithography

Fumio Aramaki, Tomokazu Kozakai, Yasuhiko Sugiyama, Masashi Muramatsu, Yoshihiro Koyama, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Ryoji Hagiwara, Anto Yasaka, Tatsuya Adachi, Yoshiyuki Tanaka, Osamu Suga, Naoki Nishida, Youichi Usui

Proceedings Volume 6283, 628310 (2006) https://doi.org/10.1117/12.681859

KEYWORDS: Etching, Photomasks, Quartz, Chromium, Transmittance, Scanning electron microscopy, Lithography, Visibility, Critical dimension metrology, Sensors

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Proceedings Article | 9 November 2005 Paper

Advanced photomask repair technology for 65nm lithography (4)

Yasutoshi Itou, Yoshiyuki Tanaka, Osamu Suga, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida

Proceedings Volume 5992, 59924Y (2005) https://doi.org/10.1117/12.632756

KEYWORDS: Gallium, Photomasks, Quartz, Ions, Transmittance, Lithography, Monte Carlo methods, 193nm lithography, Binary data, Opacity

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Proceedings Article | 28 June 2005 Paper

Advanced photomask repair technology for 65nm lithography (3)

Yasutoshi Itou, Yoshiyuki Tanaka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617344

KEYWORDS: Photomasks, Lithography, Opacity, Computer aided design, Atomic force microscopy, Surface conduction electron emitter displays, 193nm lithography, Control systems, Acoustics, Etching

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Proceedings Article | 6 December 2004 Paper

Advanced photomask repair technology for 65-nm lithography (2)

Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578615

KEYWORDS: Photomasks, Lithography, Etching, Computer aided design, Control systems, Surface conduction electron emitter displays, 193nm lithography, Chromium, Transmittance, Imaging systems

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Proceedings Article | 20 August 2004 Paper

Advanced photomask repair technology for 65-nm lithography (1)

Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Junichi Tashiro, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557789

KEYWORDS: Computer aided design, Photomasks, Lithography, Transmittance, Control systems, Carbon, Surface conduction electron emitter displays, 193nm lithography, Image resolution, Raman spectroscopy

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Proceedings Article | 20 August 2004 Paper

Application of atomic force microscope to 65-nm node photomasks

Yoshiyuki Tanaka, Yasutoshi Itou, Nobuyuki Yoshioka, Katsuhiro Matsuyama, Dean Dawson

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557763

KEYWORDS: Photomasks, Metrology, Atomic force microscopy, Critical dimension metrology, 3D metrology, Microscopes, Atomic force microscope, Contamination, Chromium, Semiconductors

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Proceedings Article | 17 December 2003 Paper

Advanced FIB mask repair technology for 90-nm/ArF lithography: III

Yoshiyuki Tanaka, Yasutoshi Itou, Nobuyuki Yoshioka, Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, Yoshihiro Koyama, Hiroshi Sawaragi, Yasuhiko Sugiyama, Masashi Muramatsu, Toshio Doi, Katsumi Suzuki, Mamoru Okabe, Masashi Shinohara, Osamu Matsuda, Kazuo Aita, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Satoh, Naoya Hayashi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518026

KEYWORDS: Printing, Photomasks, Binary data, Image processing, Lithography, Ions, Opacity, Transmittance, Imaging systems, Surface conduction electron emitter displays

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Proceedings Article | 28 August 2003 Paper

Advanced NLD mask dry etching system for 90-nm node technology

Noriyuki Harashima, Takaei Sasaki, Kiyoshi Kuwahara, Toshio Hayashi, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Mutsumi Hara, Yukio Ohkubo

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504200

KEYWORDS: Photomasks, Etching, Dry etching, Plasma, Helium, Magnetism, Chromium, Scanning electron microscopy, Semiconductors, Lithography

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Proceedings Article | 27 December 2002 Paper

Improvement of NLD mask dry etching system for 100-nm-node technology

Yoshiyuki Tanaka, Nobuyuki Yoshioka, Noriyuki Harashima, Takaei Sasaki, Kiyoshi Kuwahara, Toshio Hayashi, Mutsumi Hara, Yasushi Ohkubo

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467914

KEYWORDS: Antennas, Etching, Dry etching, Photomasks, Plasma, Lithography, Photoresist processing, Control systems, Modulation

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Showing 5 of 10 publications

Conference Committee Involvement (1)

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

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