Ms. Yuriko Seino Profile

Yuriko Seino

at EUVL Infrastructure Development Ctr Inc

SPIE Involvement:

Author

Publications (22)

Proceedings Article | 19 March 2018 Presentation

Presentation

Defect dynamics in directed self-assembly of block copolymers (Conference Presentation)

Tsukasa Azuma, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsuyoshi Kodera, Ken Miyagi, Masayuki Shiraishi, Ryota Matsuki, Terumasa Kosaka, Toshiyuki Himi, Seiji Nagahara, Alvin Chandra, Ryuichi Nakatani, Teruaki Hayakawa, Kenji Yoshimoto, Takuya Omosu, Mikihito Takenaka

Proceedings Volume 10586, 105860S (2018) https://doi.org/10.1117/12.2297310

KEYWORDS: Directed self assembly, Image processing, Signal processing, Electron beam lithography, Lithography, Annealing, Thin films, Epitaxy, Data modeling, 3D modeling

Read Abstract +

Proceedings Article | 13 March 2018 Presentation + Paper

Presentation + Paper

A simulation study on bridge defects in lamellae-forming diblock copolymers

Hironobu Sato, Katsuyoshi Kodera, Yuriko Seino, Yusuke Kasahara, Ken Miyagi, Masayuki Shiraishi, Tsukasa Azuma

Proceedings Volume 10586, 105860U (2018) https://doi.org/10.1117/12.2297287

KEYWORDS: Bridges, Polymethylmethacrylate, Picosecond phenomena, Etching, Molecular bridges, Reactive ion etching, Directed self assembly, Photomasks, Image processing, Chemical analysis

Read Abstract +

Proceedings Article | 25 May 2017 Presentation

Presentation

Nano-defect management in directed self-assembly of block copolymers (Conference Presentation)

Tsukasa Azuma, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsuyoshi Kodera, Phubes Jiravanichsakul, Teruaki Hayakawa, Kenji Yoshimoto, Mikihito Takenaka

Proceedings Volume 10146, 101460O (2017) https://doi.org/10.1117/12.2257936

KEYWORDS: Annealing, 3D modeling, Lithography, Optical lithography, Scattering, Atomic force microscopy, Data modeling, Semiconductor manufacturing, Directed self assembly, Materials processing

Read Abstract +

Directed self-assembly (DSA) of block copolymers (BCPs) has been expected to become one of the most promising next generation lithography candidates for sub-15 nm line patterning and sub-20 nm contact hole patterning. In order to provide the DSA lithography to practical use in advanced semiconductor device manufacturing, defect mitigation in the DSA materials and processes is the primary challenge. We need to clarify the defect generation mechanism using in-situ measurement of self-assembling processes of BCPs in cooperation with modeling approaches to attain the DSA defect mitigation. In this work, we thus employed in-situ atomic force microscope (AFM) and grazing-incidence small angle X-ray scattering (GI-SAXS) and investigated development of surface morphology as well as internal structure during annealing processes. Figure 1 shows series of the AFM images of PMAPOSS-b-PTFEMA films during annealing processes. The images clearly show that vitrified sponge-like structure without long-range order in as-spun film transforms into lamellar structure and that the long range order of the lamellar structure increases with annealing temperature. It is well-known that ordering processes of BCPs from disordered state in bulk progress via nucleation and growth. In contrary to the case of bulk, the observed processes seem to be spinodal decomposition. This is because the structure in as-spun film is not the concentration fluctuation of disordered state but the vitrified sponge-like structure. The annealing processes induce order-order transition from non-equilibrium ordered-state to the lamellar structure. The surface tension assists the transition and directs the orientation. Figure 2 shows scattering patterns of (a) vicinity of film top and (b) whole sample of the GI-SAXS. We can find vertically oriented lamellar structure in the vicinity of film top while horizontally oriented lamellar structures in the vicinity of film bottom, indicating that the GI-SAXS measurement can clarify the variation of the morphologies in depth direction and that the surface tension affects the orientation of the lamellar structure. Finally a combination of the time development data in the in-situ AFM and the GI-SAXS is used to develop a kinetic modeling for prediction of dynamical change in three-dimensional nano-structures. A part of this work was funded by the New Energy and Industrial Technology Development Organization (NEDO) in Japan under the EIDEC project.

Proceedings Article | 4 April 2016 Paper

Paper

Advanced CD-SEM metrology for qualification of DSA patterns using coordinated line epitaxy (COOL) process

Takeshi Kato, Junko Konishi, Masami Ikota, Satoru Yamaguchi, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Tsukasa Azuma

Proceedings Volume 9778, 977816 (2016) https://doi.org/10.1117/12.2218605

KEYWORDS: Directed self assembly, Epitaxy, Chemical analysis, Line width roughness, Annealing, Etching, Line edge roughness, Polymethylmethacrylate, Lithography, Edge roughness

Read Abstract +

Proceedings Article | 1 April 2016 Paper

Paper

Grapho-epitaxial sub-10nm line and space patterning using lamellar-forming Si-containing block copolymer

Hironobu Sato, Yusuke Kasahara, Naoko Kihara, Yuriko Seino, Ken Miyagi, Shinya Minegishi, Hitoshi Kubota, Katsutoshi Kobayashi, Hideki Kanai, Katsuyoshi Kodera, Yoshiaki Kawamonzen, Masayuki Shiraishi, Hitoshi Yamano, Satoshi Nomura, Tsukasa Azuma, Teruaki Hayakawa

Proceedings Volume 9777, 97771S (2016) https://doi.org/10.1117/12.2218758

KEYWORDS: Molecular self-assembly, Polymers, Etching, Directed self assembly, Transmission electron microscopy, Silicon, Electron microscopes, Surface properties, Lithography, Reactive ion etching

Read Abstract +

Proceedings Article | 1 April 2016 Paper

Paper

Sub-10nm lines and spaces patterning using grapho-epitaxial directed self-assembly of lamellar block copolymers

Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Shinya Minegishi, Ken Miyagi, Hitoshi Kubota, Hideki Kanai, Katsuyoshi Kodera, Masayuki Shiraishi, Naoko Kihara, Yoshiaki Kawamonzen, Toshikatsu Tobana, Katsutoshi Kobayashi, Hitoshi Yamano, Tsukasa Azuma, Satoshi Nomura

Proceedings Volume 9777, 97771T (2016) https://doi.org/10.1117/12.2218787

KEYWORDS: Optical lithography, Metals, Photoresist processing, Semiconductor manufacturing, Semiconductors, Manufacturing, Epitaxy, Semiconducting wafers, Scanning electron microscopy, Silica, Directed self assembly, Etching, Photomasks, Electron beam lithography, Chemical mechanical planarization, Reactive ion etching, Metrology, Tin

Read Abstract +

Proceedings Article | 23 March 2016 Paper

Paper

Reactive ion etching challenges for half-pitch sub-10-nm line-and-space pattern fabrication using directed self-assembly lithography

Yusuke Kasahara, Yuriko Seino, Hironobu Sato, Hitoshi Kubota, Hideki Kanai, Naoko Kihara, Shinya Minegishi, Ken Miyagi, Toshikatsu Tobana, Masayuki Shiraishi, Katsutoshi Kobayashi, Katsuyoshi Kodera, Hitoshi Yamano, Yoshiaki Kawamonzen, Tsukasa Azuma

Proceedings Volume 9782, 97820P (2016) https://doi.org/10.1117/12.2219081

KEYWORDS: Reactive ion etching, Optical lithography, Polymers, Lithography, Semiconductor manufacturing, Silicon, Metals, Semiconductors, Manufacturing, Directed self assembly, Photomasks, Scanning electron microscopy, Silica, Chemical mechanical planarization

Read Abstract +

SPIE Journal Paper | 9 April 2015 Open Access

Open Access

Sub-10-nm patterning process using directed self-assembly with high χ block copolymers

Naoko Kihara, Yuriko Seino, Hironobu Sato, Yusuke Kasahara, Katsutoshi Kobayashi, Ken Miyagi, Shinya Minegishi, Koichi Yatsuda, Tomoharu Fujiwara, Noriyuki Hirayanagi, Hideki Kanai, Yoshiaki Kawamonzen, Katsuyoshi Kodera, Tsukasa Azuma, Teruaki Hayakawa

JM3, Vol. 14, Issue 02, 023502, (April 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.2.023502

KEYWORDS: Etching, Polymethylmethacrylate, Optical lithography, Silicon, Polymers, Lithography, Scanning electron microscopy, Image processing, Polymerization, Directed self assembly

Read Abstract +

Proceedings Article | 19 March 2015 Paper

Paper

Directed self-assembly lithography using coordinated line epitaxy (COOL) process

Yuriko Seino, Yusuke Kasahara, Hironobu Sato, Katsutoshi Kobayashi, Hitoshi Kubota, Shinya Minegishi, Ken Miyagi, Hideki Kanai, Katsuyoshi Kodera, Naoko Kihara, Yoshiaki Kawamonzen, Toshikatsu Tobana, Masayuki Shiraishi, Satoshi Nomura, Tsukasa Azuma

Proceedings Volume 9423, 942316 (2015) https://doi.org/10.1117/12.2085697

KEYWORDS: Etching, Picosecond phenomena, Lithography, Semiconducting wafers, Reactive ion etching, Metals, Scanning electron microscopy, Photoresist processing, Optical alignment, Directed self assembly

Read Abstract +

Proceedings Article | 17 March 2015 Paper

Paper

RIE challenges for sub-15 nm line-and-space patterning using directed self-assembly lithography with coordinated line epitaxy (COOL) process

Y. Kasahara, Y. Seino, K. Kobayashi, H. Kanai, H. Sato, H. Kubota, T. Tobana, S. Minegishi, K. Miyagi, N. Kihara, K. Kodera, M. Shiraishi, Y. Kawamonzen, S. Nomura, T. Azuma

Proceedings Volume 9428, 94280S (2015) https://doi.org/10.1117/12.2085704

KEYWORDS: Reactive ion etching, Optical lithography, Lithography, Etching, Epitaxy, Picosecond phenomena, Scanning electron microscopy, Silica, Semiconducting wafers, Directed self assembly

Read Abstract +

Proceedings Article | 28 March 2014 Paper

Paper

Defect-aware process margin for chemo-epitaxial directed self-assembly lithography using simulation method based on self-consistent field theory

Katsuyoshi Kodera, Hironobu Sato, Hideki Kanai, Yuriko Seino, Naoko Kihara, Yusuke Kasahara, Katsutoshi Kobayashi, Ken Miyagi, Shinya Minegishi, Koichi Yatsuda, Tomoharu Fujiwara, Noriyuki Hirayanagi, Yoshiaki Kawamonzen, Tsukasa Azuma

Proceedings Volume 9049, 904926 (2014) https://doi.org/10.1117/12.2046159

KEYWORDS: Monte Carlo methods, Lithography, Particles, Thin film coatings, Systems modeling, Computer simulations, Image segmentation, Extreme ultraviolet lithography, Semiconductors, Directed self assembly

Read Abstract +

SPIE Journal Paper | 12 August 2013 Open Access

Open Access

Contact hole shrink process using graphoepitaxial directed self-assembly lithography

Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno, Hirokazu Kato, Katsutoshi Kobayashi, Ayako Kawanishi, Tsukasa Azuma, Makoto Muramatsu, Seiji Nagahara, Takahiro Kitano, Takayuki Toshima

JM3, Vol. 12, Issue 03, 033011, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.033011

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Lithography, Polymethylmethacrylate, System on a chip, Semiconductor manufacturing, Tolerancing, Optical lithography, Picosecond phenomena, Directed self assembly

Read Abstract +

Proceedings Article | 26 March 2013 Paper

Paper

Dissipative particle dynamics simulations to optimize contact hole shrink process using graphoepitaxial directed self-assembly

Hironobu Sato, Hiroki Yonemitsu, Yuriko Seino, Hirokazu Kato, Masahiro Kanno, Katsutoshi Kobayashi, Ayako Kawanishi, Katsuyoshi Kodera, Tsukasa Azuma

Proceedings Volume 8680, 86801K (2013) https://doi.org/10.1117/12.2009622

KEYWORDS: Picosecond phenomena, Polymethylmethacrylate, Lithography, Particles, System on a chip, 193nm lithography, Critical dimension metrology, Semiconductor manufacturing, Computer simulations, Directed self assembly

Read Abstract +

Proceedings Article | 26 March 2013 Paper

Paper

Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method

Katsuyoshi Kodera, Shimon Maeda, Satoshi Tanaka, Shoji Mimotogi, Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Tsukasa Azuma

Proceedings Volume 8680, 868015 (2013) https://doi.org/10.1117/12.2011439

KEYWORDS: Particles, Lithography, Critical dimension metrology, Error analysis, Neodymium, Radon, Polymethylmethacrylate, Polymers, Semiconductors, Directed self assembly

Read Abstract +

SPIE Journal Paper | 9 July 2012

Nanopatterning of diblock copolymer directed self-assembly lithography with wet development

Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Mark Somervell, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi, Tsukasa Azuma

JM3, Vol. 11, Issue 3, 031305, (July 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031305

KEYWORDS: Polymethylmethacrylate, Picosecond phenomena, Ultraviolet radiation, Lithography, Mercury, Nanostructures, Oxygen, Lamps, Scanning electron microscopy, Directed self assembly

Read Abstract +

Proceedings Article | 21 March 2012 Paper

Paper

Contact hole shrink process using directed self-assembly

Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno, Hikazu Kato, Katsutoshi Kobayashi, Ayako Kawanishi, Tsukasa Azuma, Makoto Muramatsu, Seiji Nagahara, Takahiro Kitano, Takayuki Toshima

Proceedings Volume 8323, 83230Y (2012) https://doi.org/10.1117/12.915652

KEYWORDS: Deep ultraviolet, Polymethylmethacrylate, Photoresist developing, Picosecond phenomena, Photoresist materials, Scanning electron microscopy, Lithography, System on a chip, Photomicroscopy, Directed self assembly

Read Abstract +

Proceedings Article | 4 April 2011 Paper

Paper

Nanopatterning of diblock copolymer directed self-assembly lithography with wet development

Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi, Tsukasa Azuma

Proceedings Volume 7970, 79701F (2011) https://doi.org/10.1117/12.878931

KEYWORDS: Picosecond phenomena, Polymethylmethacrylate, Ultraviolet radiation, Lithography, Lamps, Mercury, Scanning electron microscopy, Oxygen, Photography, Directed self assembly

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Paper

Resist process control for 32-nm logic node and beyond with NA > 1.30 immersion exposure tool

Seiji Nagahara, Kazuhiro Takahata, Seiji Nakagawa, Takashi Murakami, Kazuhiro Takeda, Shinpei Nakamura, Makoto Ueki, Masaki Satake, Tatsuhiko Ema, Hiroharu Fujise, Hiroki Yonemitsu, Yuriko Seino, Shinichiro Nakagawa, Masafumi Asano, Yosuke Kitamura, Takayuki Uchiyama, Shoji Mimotogi, Makoto Tominaga

Proceedings Volume 7273, 72733A (2009) https://doi.org/10.1117/12.813498

KEYWORDS: Resolution enhancement technologies, Logic, Optical lithography, Line width roughness, Photoresist processing, Lithography, Photomasks, Copper, Diffusion, Logic devices

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Paper

Feasibility of ultra-low k1 lithography for 28nm CMOS node

Shoji Mimotogi, Kazuhiro Takahata, Takashi Murakami, Seiji Nagahara, Kazuhiro Takeda, Masaki Satake, Yosuke Kitamura, Tomoko Ojima, Hiroharu Fujise, Yuriko Seino, Tatsuhiko Ema, Hiroki Yonemitsu, Manabu Takakuwa, Shinichiro Nakagawa, Takuya Kono, Masafumi Asano, Suigen Kyoh, Hideaki Harakawa, Akiko Nomachi, Tatsuya Ishida, Shunsuke Hasegawa, Katsura Miyashita, Makoto Tominaga, Soichi Inoue

Proceedings Volume 7274, 72741F (2009) https://doi.org/10.1117/12.814040

KEYWORDS: Lithography, Photomasks, Lithographic illumination, Binary data, Scanners, SRAF, Logic devices, Optical lithography, Metals, Semiconductors

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Paper

Patterning performance of hyper NA immersion lithography for 32nm node logic process

Kazuhiro Takahata, Masanari Kajiwara, Yosuke Kitamura, Tomoko Ojima, Masaki Satake, Hiroharu Fujise, Yuriko Seino, Tatsuhiko Ema, Manabu Takakuwa, Shinichiro Nakagawa, Takuya Kono, Masafumi Asano, Suigen Kyo, Akiko Nomachi, Hideaki Harakawa, Tatsuya Ishida, Shunsuke Hasegawa, Katsura Miyashita, Takashi Murakami, Seiji Nagahara, Kazuhiro Takeda, Shoji Mimotogi, Soichi Inoue

Proceedings Volume 7140, 714017 (2008) https://doi.org/10.1117/12.804739

KEYWORDS: Resolution enhancement technologies, Optical lithography, Logic, Lithography, SRAF, Metals, Immersion lithography, Semiconductors, Optical proximity correction, Logic devices

Read Abstract +

Proceedings Article | 31 March 2008 Paper

Paper

Immersion resist process for 32-nm node logic devices

Tatsuhiko Ema, Koutaro Sho, Hiroki Yonemitsu, Yuriko Seino, Hiroharu Fujise, Akiko Yamada, Shoji Mimotogi, Yosuke Kitamura, Satoshi Nagai, Kotaro Fujii, Takashi Fukushima, Toshiaki Komukai, Akiko Nomachi, Tsukasa Azuma, Shinichi Ito

Proceedings Volume 6923, 69230E (2008) https://doi.org/10.1117/12.771008

KEYWORDS: Photoresist processing, Logic devices, Reflectivity, Photomasks, System on a chip, Etching, Transparency, Materials processing, Immersion lithography

Read Abstract +

Proceedings Article | 26 March 2008 Paper

Paper

Sub-45nm resist process using stacked-mask process

Yuriko Seino, Katsutoshi Kobayashi, Koutaro Sho, Hirokazu Kato, Seiro Miyoshi, Keisuke Kikutani, Junko Abe, Hisataka Hayashi, Tokuhisa Ohiwa, Yasunobu Oonishi, Shinichi Ito

Proceedings Volume 6923, 69232O (2008) https://doi.org/10.1117/12.771840

KEYWORDS: System on a chip, Etching, Reactive ion etching, Reflectivity, Hydrogen, Fluorine, Lithography, Photoresist processing, Silica, Scanning electron microscopy

Read Abstract +

Showing 5 of 22 publications

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement